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市場調查報告書
商品編碼
1947512

極紫外線 (EUV) 微影市場：依設備（曝光系統、光源、光學元件和反射鏡、掩模相關系統）、技術（標準 EUV/NXE、高數值孔徑 EUV/EXE）和應用（代工廠、記憶體、整合裝置製造商）劃分 - 全球預測至 2036 年

Extreme Ultraviolet (EUV) Lithography Market by Equipment (Exposure Systems, Light Sources, Optics & Mirrors, Mask-related Systems), Technology (Standard EUV/NXE, High-NA EUV/EXE), and End-use (Foundry, Memory, IDM) - Global Forecast to 2036
出版日期: | 出版商: Meticulous Research | 英文 273 Pages | 商品交期: 5-7個工作天內

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簡介目錄

全球 EUV 光刻市場預計在預測期（2026-2036 年）內將以 8.4% 的複合年增長率增長，從 2026 年的 119.3 億美元增長到 2036 年的約 268.1 億美元。

本報告對全球五大主要地區的 EUV 光刻市場進行了詳細分析，重點關注當前市場趨勢、市場規模、近期發展以及至 2036 年的預測。透過廣泛的二級和一級研究以及對市場情景的深入分析，本報告對關鍵產業驅動因素、限制因素、機會和挑戰的影響進行了分析。

推動極紫外光刻市場成長的關鍵因素包括全球對先進半導體微縮技術日益增長的關注，以及高效能運算和人工智慧應用的快速發展。此外，高數值孔徑（NA）極紫外光刻技術的日益普及、先進代工廠對高可靠性圖形化需求的增長，以及與數位化製造的日益融合，預計都將為極紫外光刻市場的企業創造巨大的成長機會。

市場區隔

目錄

第一章：引言

第二章：摘要整理

第三章：市場概覽

  • 市場動態
    • 驅動因素
    • 限制因素
    • 機遇
    • 挑戰
  • 高數值孔徑 (NA) 和人工智慧 (AI) 對極紫外線 (EUV) 微影的影響
  • 監管環境與半導體標準
  • 波特五力分析

第四章：全球極紫外線 (EUV) 微影市場（依設備類型劃分）

  • 曝光系統（步進式/掃描式）
    • NXE 系列（標準 EUV）
    • EXE 系列（高數值孔徑 EUV）
  • 光源（LPP/DPP）
  • 光學元件與反射鏡
  • 掩模相關系統
    • 掩模偵測（曝光/非曝光）
    • 掩模坯與光阻
  • 其他（計量和檢測）

第五章：全球極紫外線 (EUV) 微影市場（以技術劃分）

  • 標準 EUV (NXE)
  • 高數值孔徑 EUV (EXE)

第六章：全球極紫外線 (EUV) 微影市場（以技術劃分）

  • 晶圓代工廠
  • 記憶體（DRAM/NAND）
  • 整合元件製造商 (IDM)

第七章 全球極紫外線 (EUV) 微影市場（依地區劃分）

  • 北美
    • 美國
    • 加拿大
  • 歐洲
    • 德國
    • 法國
    • 英國
    • 義大利
    • 西班牙
    • 荷蘭
    • 歐洲其他地區
  • 亞太地區
    • 中國
    • 印度
    • 日本
    • 韓國
    • 東南亞
    • 澳大利亞
    • 亞太其他地區
  • 拉丁美洲美洲
    • 巴西
    • 墨西哥
    • 拉丁美洲其他地區
  • 中東和非洲
    • 沙烏地阿拉伯
    • 阿拉伯聯合大公國
    • 南非
    • 中東和非洲其他地區

第八章 競爭格局

  • 關鍵成長策略
  • 競爭標竿分析
  • 競爭概覽
    • 行業領導者
    • 市場差異化因素
    • 先鋒企業
    • 新興企業
  • 主要企業市場排名/定位分析（2025 年）

第九章：公司簡介（製造商和供應商）

  • ASML Holding N.V.
  • ZEISS SMT
  • Lasertec Corporation
  • KLA Corporation
  • Applied Materials, Inc.
  • Ushio Inc.
  • Gigaphoton Inc.
  • Tokyo Electron Limited
  • Toppan Holdings Inc.
  • HOYA Corporation
  • JSR Corporation
  • Shin-Etsu Chemical Co., Ltd.

第10章 附錄

簡介目錄
Product Code: MRSE - 1041751

According to the research report titled, 'Extreme Ultraviolet (EUV) Lithography Market by Equipment (Exposure Systems, Light Sources, Optics & Mirrors, Mask-related Systems), Technology (Standard EUV/NXE, High-NA EUV/EXE), and End-use (Foundry, Memory, IDM) - Global Forecast to 2036,' the global EUV lithography market is expected to reach approximately USD 26.81 billion by 2036 from USD 11.93 billion in 2026, at a CAGR of 8.4% during the forecast period (2026-2036).

The report provides an in-depth analysis of the global EUV lithography market across five major regions, emphasizing the current market trends, market sizes, recent developments, and forecasts till 2036. Following extensive secondary and primary research and an in-depth analysis of the market scenario, the report conducts the impact analysis of the key industry drivers, restraints, opportunities, and challenges.

The major factors driving the growth of the EUV lithography market include the intensifying global focus on advanced semiconductor scaling and the rapid expansion of high-performance computing and artificial intelligence applications. Additionally, the rapid expansion of High-NA EUV initiatives, increasing need for high-reliability patterning in advanced foundry complexes, and digital manufacturing integration are expected to create significant growth opportunities for players operating in the EUV lithography market.

Market Segmentation

The EUV lithography market is segmented by equipment (exposure systems, light sources, optics & mirrors, mask-related systems), technology (standard EUV/NXE, high-NA EUV/EXE), end-use (foundry, memory, IDM), and geography. The study also evaluates industry competitors and analyzes the market at the country level.

Based on Equipment

By equipment, the exposure systems segment holds the largest market share in 2026, primarily attributed to its critical role in supporting high-volume manufacturing and rapid node transition requirements. These systems provide the core patterning infrastructure necessary for advanced semiconductor fabrication and enable high-precision wafer processing. However, the light sources and optics & mirrors segments are expected to grow at significant CAGRs during the forecast period, driven by the increasing adoption of High-NA EUV platforms and the need for enhanced optical performance. The ability to deliver integrated solutions with proven manufacturing efficacy makes advanced equipment platforms highly attractive for semiconductor fabrication facilities.

Based on Technology

By technology, the standard EUV/NXE segment holds the largest market share in 2026, primarily due to its established manufacturing infrastructure, proven reliability, and widespread adoption in advanced logic and memory production. The standard EUV platforms have become essential for sub-3nm node manufacturing and continue to support high-volume production across the semiconductor industry. The High-NA EUV/EXE segment is expected to witness the fastest growth during the forecast period, driven by the need for improved resolution capabilities, enhanced overlay accuracy, and advanced patterning performance. High-NA systems represent the next generation of EUV technology with superior capabilities for sub-2nm and sub-1nm node scaling.

Based on End-use

By end-use, the foundry segment holds the largest share of the overall market in 2026, due to its critical role in supporting diverse semiconductor manufacturing needs and its position as a primary driver of advanced node adoption. Foundries operate at the forefront of technology scaling and represent the largest consumer of EUV lithography equipment. The memory segment is expected to grow at a significant CAGR during the forecast period, driven by the increasing demand for advanced DRAM and NAND flash memory at smaller nodes. The integrated device manufacturer (IDM) segment represents an emerging segment with growing adoption of EUV technology for in-house semiconductor manufacturing and advanced node production.

Geographic Analysis

An in-depth geographic analysis of the industry provides detailed qualitative and quantitative insights into the five major regions (North America, Europe, Asia-Pacific, Latin America, and the Middle East & Africa) and the coverage of major countries in each region. In 2026, Asia-Pacific dominates the global EUV lithography market with the largest market share, primarily attributed to massive investments in advanced logic and memory fabrication facilities and the rapid adoption of High-NA solutions in Taiwan, South Korea, and Japan. North America is expected to maintain significant market presence during the forecast period, supported by strong semiconductor manufacturing capabilities and continued investment in advanced technology development. Europe, Latin America, and the Middle East & Africa represent emerging markets with growing semiconductor manufacturing infrastructure and increasing adoption of advanced EUV lithography solutions.

Key Players

The key players operating in the global EUV lithography market are ASML Holding N.V., Nikon Corporation, Canon Inc., Carl Zeiss SMT GmbH, Cynosure, Coherent Corporation, Lam Research Corporation, Applied Materials Inc., KLA Corporation, Onto Innovation Inc., and various other regional and emerging equipment manufacturers, among others.

Key Questions Answered in the Report-

  • What is the current revenue generated by the EUV lithography market globally?
  • At what rate is the global EUV lithography market demand projected to grow for the next 7-10 years?
  • What are the historical market sizes and growth rates of the global EUV lithography market?
  • What are the major factors impacting the growth of this market at the regional and country levels? What are the major opportunities for existing players and new entrants in the market?
  • Which segments in terms of equipment, technology, and end-use are expected to create major traction for the service providers in this market?
  • What are the key geographical trends in this market? Which regions/countries are expected to offer significant growth opportunities for the companies operating in the global EUV lithography market?
  • Who are the major players in the global EUV lithography market? What are their specific product offerings in this market?
  • What are the recent strategic developments in the global EUV lithography market? What are the impacts of these strategic developments on the market?

Scope of the Report:

EUV Lithography Market Assessment -- by Equipment

  • Exposure Systems
  • Light Sources
  • Optics & Mirrors
  • Mask-related Systems

EUV Lithography Market Assessment -- by Technology

  • Standard EUV/NXE
  • High-NA EUV/EXE

EUV Lithography Market Assessment -- by End-use

  • Foundry
  • Memory
  • IDM

EUV Lithography Market Assessment -- by Geography

  • North America
    • U.S.
    • Canada
  • Europe
    • Germany
    • France
    • UK
    • Italy
    • Spain
    • Rest of Europe
  • Asia-Pacific
    • China
    • India
    • Japan
    • South Korea
    • Taiwan
    • Rest of Asia-Pacific
  • Latin America
    • Brazil
    • Mexico
    • Argentina
    • Rest of Latin America
  • Middle East & Africa
    • Saudi Arabia
    • UAE
    • South Africa
    • Rest of Middle East & Africa

TABLE OF CONTENTS

1. Introduction

  • 1.1. Market Definition
  • 1.2. Market Scope
  • 1.3. Research Methodology
  • 1.4. Assumptions & Limitations

2. Executive Summary

3. Market Overview

  • 3.1. Introduction
  • 3.2. Market Dynamics
    • 3.2.1. Drivers
    • 3.2.2. Restraints
    • 3.2.3. Opportunities
    • 3.2.4. Challenges
  • 3.3. Impact of High-NA and AI on EUV Lithography
  • 3.4. Regulatory Landscape & Semiconductor Standards
  • 3.5. Porter's Five Forces Analysis

4. Global Extreme Ultraviolet (EUV) Lithography Market, by Equipment

  • 4.1. Introduction
  • 4.2. Exposure Systems (Steppers/Scanners)
    • 4.2.1. NXE Series (Standard EUV)
    • 4.2.2. EXE Series (High-NA EUV)
  • 4.3. Light Sources (LPP / DPP)
  • 4.4. Optics & Mirrors
  • 4.5. Mask-related Systems
    • 4.5.1. Mask Inspection (Actinic / Non-actinic)
    • 4.5.2. Mask Blanks & Pellicles
  • 4.6. Others (Metrology & Inspection)

5. Global Extreme Ultraviolet (EUV) Lithography Market, by Technology

  • 5.1. Introduction
  • 5.2. Standard EUV (NXE)
  • 5.3. High-NA EUV (EXE)

6. Global Extreme Ultraviolet (EUV) Lithography Market, by End-use

  • 6.1. Introduction
  • 6.2. Foundry
  • 6.3. Memory (DRAM / NAND)
  • 6.4. IDM (Integrated Device Manufacturers)

7. Global Extreme Ultraviolet (EUV) Lithography Market, by Region

  • 7.1. Introduction
  • 7.2. North America
    • 7.2.1. U.S.
    • 7.2.2. Canada
  • 7.3. Europe
    • 7.3.1. Germany
    • 7.3.2. France
    • 7.3.3. U.K.
    • 7.3.4. Italy
    • 7.3.5. Spain
    • 7.3.6. Netherlands
    • 7.3.7. Rest of Europe
  • 7.4. Asia-Pacific
    • 7.4.1. China
    • 7.4.2. India
    • 7.4.3. Japan
    • 7.4.4. South Korea
    • 7.4.5. Southeast Asia
    • 7.4.6. Australia
    • 7.4.7. Rest of Asia-Pacific
  • 7.5. Latin America
    • 7.5.1. Brazil
    • 7.5.2. Mexico
    • 7.5.3. Rest of Latin America
  • 7.6. Middle East & Africa
    • 7.6.1. Saudi Arabia
    • 7.6.2. UAE
    • 7.6.3. South Africa
    • 7.6.4. Rest of Middle East & Africa

8. Competitive Landscape

  • 8.1. Overview
  • 8.2. Key Growth Strategies
  • 8.3. Competitive Benchmarking
  • 8.4. Competitive Dashboard
    • 8.4.1. Industry Leaders
    • 8.4.2. Market Differentiators
    • 8.4.3. Vanguards
    • 8.4.4. Emerging Companies
  • 8.5. Market Ranking / Positioning Analysis of Key Players, 2025

9. Company Profiles (Manufacturers & Providers)

  • 9.1. ASML Holding N.V.
  • 9.2. ZEISS SMT
  • 9.3. Lasertec Corporation
  • 9.4. KLA Corporation
  • 9.5. Applied Materials, Inc.
  • 9.6. Ushio Inc.
  • 9.7. Gigaphoton Inc.
  • 9.8. Tokyo Electron Limited
  • 9.9. Toppan Holdings Inc.
  • 9.10. HOYA Corporation
  • 9.11. JSR Corporation
  • 9.12. Shin-Etsu Chemical Co., Ltd.

10. Appendix

  • 10.1. Questionnaire
  • 10.2. Related Reports