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市場調查報告書
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1901660

極紫外光刻市場－全球產業規模、佔有率、趨勢、機會及預測（依技術節點、組件類型、終端用戶產業、區域及競爭格局分類，2021-2031年預測）

Extreme Ultraviolet Lithography Market - Global Industry Size, Share, Trends, Opportunity, and Forecast Segmented By Technology Node, By Component Type, By End-Use Industry, By Region & Competition, 2021-2031F
出版日期: | 出版商: TechSci Research | 英文 181 Pages | 商品交期: 2-3個工作天內

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簡介目錄

全球極紫外（EUV）微影市場規模將從2025年的93.4億美元成長至2031年的185.2億美元，複合年成長率（CAGR）為12.09%。極紫外線（EUV）微影是一種先進的半導體製造技術，它利用波長13.5奈米的光在矽晶圓上印製複雜的電路圖案。該市場的主要驅動力是人工智慧、自動駕駛和下一代通訊等領域對小型化、高性能微晶片日益成長的需求。

市場概覽
預測期 2027-2031
市場規模：2025年 93.4億美元
市場規模：2031年 185.2億美元
複合年成長率：2026-2031年 12.09%
成長最快的細分市場 整合裝置製造商（IDM）
最大的市場 亞太地區

主要市場促進因素

對高效能運算和人工智慧解決方案的激增需求是加速採用極紫外光刻技術的主要催化劑，因為生成式人工智慧的運算強度要求晶片架構具備前所未有的電晶體密度。半導體製造商正在迅速調整生產重點，以滿足人工智慧加速器和高頻寬記憶體（HBM）的需求，這兩者都需要只有極紫外光刻波長才能分辨的精確關鍵尺寸。

主要市場挑戰

EUV系統高昂的資本支出和技術複雜性構成了阻礙全球極紫外光微影市場更廣泛擴張的重大障礙。這些財務和技術壁壘限制了這項技術的應用，只有少數資金雄厚的半導體製造商能夠承擔巨額的初始投資和持續的營運成本。

主要市場趨勢

向高數值孔徑 (High-NA) EUV 系統的過渡代表著關鍵的技術演進，旨在克服目前 0.33 NA 工具的解析度限制。

目錄

第1章：產品概述

第2章：研究方法

第3章：執行概要

第4章：客戶之聲

第5章：全球極紫外線（EUV）微影市場展望

  • 市場規模及預測
    • 按價值
  • 市佔率及預測
    • 依組件類型（光源（EUV光源）、反射鏡和光學元件、掩模和掩模處理系統、其他）
    • 按最終用途行業分類（半導體製造、整合裝置製造商 (IDM)、晶圓代工廠、記憶體製造商、其他）
    • 按地區
    • 按公司（2025 年）
  • 市場地圖

第6章：北美極紫外線（EUV）微影市場展望

  • 市場規模及預測
  • 市佔率及預測
  • 北美洲：國家分析
    • 美國
    • 加拿大
    • 墨西哥

第7章：歐洲極紫外線（EUV）光刻市場展望

  • 市場規模及預測
  • 市佔率及預測
  • 歐洲：國家分析
    • 德國
    • 法國
    • 英國
    • 義大利
    • 西班牙

第8章：亞太地區極紫外線（EUV）微影市場展望

  • 市場規模及預測
  • 市佔率及預測
  • 亞太地區：國家分析
    • 中國
    • 印度
    • 日本
    • 韓國
    • 澳洲

第9章：中東與非洲極紫外線（EUV）微影市場展望

  • 市場規模及預測
  • 市佔率及預測
  • 中東和非洲：國家分析
    • 沙烏地阿拉伯
    • 阿拉伯聯合大公國
    • 南非

第10章：南美洲極紫外線（EUV）微影市場展望

  • 市場規模及預測
  • 市佔率及預測
  • 南美洲：國家分析
    • 巴西
    • 哥倫比亞
    • 阿根廷

第11章：市場動態

  • 促進要素
  • 挑戰

第12章：市場趨勢與發展

  • 併購
  • 產品發布
  • 最新進展

第13章：全球極紫外線（EUV）微影市場：SWOT分析

第14章：波特五力分析

  • 產業競爭
  • 新進入者的潛力
  • 供應商議價能力
  • 顧客的力量
  • 替代產品的威脅

第15章：競爭格局

  • ASML Holding NV.
  • CARL ZEISS AG.
  • Toppan Photomasks Inc
  • USHIO, INC
  • NTT ADVANCED TECHNOLOGY CORPORATION.
  • KLA CORPORATION
  • ADVANTEST CORPORATION
  • Photronics, Inc
  • HOYA Corporation
  • Trumpf

第16章：策略建議

第17章調查會社について,免責事項

簡介目錄
Product Code: 16038

The Global Extreme Ultraviolet (EUV) Lithography Market will grow from USD 9.34 Billion in 2025 to USD 18.52 Billion by 2031 at a 12.09% CAGR. Extreme Ultraviolet (EUV) Lithography is an advanced semiconductor manufacturing technology that utilizes light with a wavelength of 13.5 nanometers to print intricate circuit patterns on silicon wafers. The market is primarily propelled by the escalating demand for miniaturized, high-performance microchips essential for artificial intelligence, autonomous driving, and next-generation telecommunications.

Market Overview
Forecast Period2027-2031
Market Size 2025USD 9.34 Billion
Market Size 2031USD 18.52 Billion
CAGR 2026-203112.09%
Fastest Growing SegmentIntegrated Device Manufacturers (IDMs)
Largest MarketAsia Pacific

Key Market Drivers

Surging Demand for High-Performance Computing and Artificial Intelligence Solutions is the primary catalyst accelerating the adoption of Extreme Ultraviolet Lithography, as the computational intensity of generative AI necessitates chip architectures with unprecedented transistor density. Semiconductor manufacturers are rapidly shifting production priorities to accommodate AI accelerators and High Bandwidth Memory (HBM), both of which require the precise critical dimensions that only EUV wavelengths can resolve.

Key Market Challenges

The exorbitant capital expenditure and technical complexity associated with EUV systems constitute a significant obstacle impeding the broader expansion of the Global Extreme Ultraviolet Lithography Market. These financial and technical barriers restrict the adoption of this technology to a limited number of well-capitalized semiconductor manufacturers capable of sustaining the massive initial outlay and ongoing operational costs.

Key Market Trends

The Transition to High-Numerical Aperture (High-NA) EUV Systems represents a critical technological evolution designed to overcome the resolution limits of current 0.33 NA tools. By increasing the numerical aperture to 0.55, these next-generation systems allow semiconductor manufacturers to print features with significantly higher contrast and reduced line-edge roughness, thereby eliminating the need for complex and costly double-patterning techniques at sub-2nm nodes.

Key Market Players

  • ASML Holding NV.
  • CARL ZEISS AG.
  • Toppan Photomasks Inc
  • USHIO, INC
  • NTT ADVANCED TECHNOLOGY CORPORATION.
  • KLA CORPORATION
  • ADVANTEST CORPORATION
  • Photronics, Inc
  • HOYA Corporation
  • Trumpf

Report Scope:

In this report, the Global Extreme Ultraviolet (EUV) Lithography Market has been segmented into the following categories, in addition to the industry trends which have also been detailed below:

Extreme Ultraviolet (EUV) Lithography Market, By Component Type:

  • Light Source (EUV Sources)
  • Mirrors and Optics
  • Mask and Mask Handling Systems
  • Others

Extreme Ultraviolet (EUV) Lithography Market, By End-Use Industry:

  • Semiconductor Manufacturing
  • Integrated Device Manufacturers (IDMs)
  • Foundries
  • Memory Manufacturers
  • Others

Extreme Ultraviolet (EUV) Lithography Market, By Region:

  • North America
  • United States
  • Canada
  • Mexico
  • Europe
  • France
  • United Kingdom
  • Italy
  • Germany
  • Spain
  • Asia Pacific
  • China
  • India
  • Japan
  • Australia
  • South Korea
  • South America
  • Brazil
  • Argentina
  • Colombia
  • Middle East & Africa
  • South Africa
  • Saudi Arabia
  • UAE

Competitive Landscape

Company Profiles: Detailed analysis of the major companies present in the Global Extreme Ultraviolet (EUV) Lithography Market.

Available Customizations:

Global Extreme Ultraviolet (EUV) Lithography Market report with the given market data, TechSci Research offers customizations according to a company's specific needs. The following customization options are available for the report:

Company Information

  • Detailed analysis and profiling of additional market players (up to five).

Table of Contents

1. Product Overview

  • 1.1. Market Definition
  • 1.2. Scope of the Market
    • 1.2.1. Markets Covered
    • 1.2.2. Years Considered for Study
    • 1.2.3. Key Market Segmentations

2. Research Methodology

  • 2.1. Objective of the Study
  • 2.2. Baseline Methodology
  • 2.3. Key Industry Partners
  • 2.4. Major Association and Secondary Sources
  • 2.5. Forecasting Methodology
  • 2.6. Data Triangulation & Validation
  • 2.7. Assumptions and Limitations

3. Executive Summary

  • 3.1. Overview of the Market
  • 3.2. Overview of Key Market Segmentations
  • 3.3. Overview of Key Market Players
  • 3.4. Overview of Key Regions/Countries
  • 3.5. Overview of Market Drivers, Challenges, Trends

4. Voice of Customer

5. Global Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 5.1. Market Size & Forecast
    • 5.1.1. By Value
  • 5.2. Market Share & Forecast
    • 5.2.1. By Component Type (Light Source (EUV Sources), Mirrors and Optics, Mask and Mask Handling Systems, Others)
    • 5.2.2. By End-Use Industry (Semiconductor Manufacturing, Integrated Device Manufacturers (IDMs), Foundries, Memory Manufacturers, Others)
    • 5.2.3. By Region
    • 5.2.4. By Company (2025)
  • 5.3. Market Map

6. North America Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 6.1. Market Size & Forecast
    • 6.1.1. By Value
  • 6.2. Market Share & Forecast
    • 6.2.1. By Component Type
    • 6.2.2. By End-Use Industry
    • 6.2.3. By Country
  • 6.3. North America: Country Analysis
    • 6.3.1. United States Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 6.3.1.1. Market Size & Forecast
        • 6.3.1.1.1. By Value
      • 6.3.1.2. Market Share & Forecast
        • 6.3.1.2.1. By Component Type
        • 6.3.1.2.2. By End-Use Industry
    • 6.3.2. Canada Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 6.3.2.1. Market Size & Forecast
        • 6.3.2.1.1. By Value
      • 6.3.2.2. Market Share & Forecast
        • 6.3.2.2.1. By Component Type
        • 6.3.2.2.2. By End-Use Industry
    • 6.3.3. Mexico Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 6.3.3.1. Market Size & Forecast
        • 6.3.3.1.1. By Value
      • 6.3.3.2. Market Share & Forecast
        • 6.3.3.2.1. By Component Type
        • 6.3.3.2.2. By End-Use Industry

7. Europe Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 7.1. Market Size & Forecast
    • 7.1.1. By Value
  • 7.2. Market Share & Forecast
    • 7.2.1. By Component Type
    • 7.2.2. By End-Use Industry
    • 7.2.3. By Country
  • 7.3. Europe: Country Analysis
    • 7.3.1. Germany Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 7.3.1.1. Market Size & Forecast
        • 7.3.1.1.1. By Value
      • 7.3.1.2. Market Share & Forecast
        • 7.3.1.2.1. By Component Type
        • 7.3.1.2.2. By End-Use Industry
    • 7.3.2. France Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 7.3.2.1. Market Size & Forecast
        • 7.3.2.1.1. By Value
      • 7.3.2.2. Market Share & Forecast
        • 7.3.2.2.1. By Component Type
        • 7.3.2.2.2. By End-Use Industry
    • 7.3.3. United Kingdom Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 7.3.3.1. Market Size & Forecast
        • 7.3.3.1.1. By Value
      • 7.3.3.2. Market Share & Forecast
        • 7.3.3.2.1. By Component Type
        • 7.3.3.2.2. By End-Use Industry
    • 7.3.4. Italy Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 7.3.4.1. Market Size & Forecast
        • 7.3.4.1.1. By Value
      • 7.3.4.2. Market Share & Forecast
        • 7.3.4.2.1. By Component Type
        • 7.3.4.2.2. By End-Use Industry
    • 7.3.5. Spain Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 7.3.5.1. Market Size & Forecast
        • 7.3.5.1.1. By Value
      • 7.3.5.2. Market Share & Forecast
        • 7.3.5.2.1. By Component Type
        • 7.3.5.2.2. By End-Use Industry

8. Asia Pacific Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 8.1. Market Size & Forecast
    • 8.1.1. By Value
  • 8.2. Market Share & Forecast
    • 8.2.1. By Component Type
    • 8.2.2. By End-Use Industry
    • 8.2.3. By Country
  • 8.3. Asia Pacific: Country Analysis
    • 8.3.1. China Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 8.3.1.1. Market Size & Forecast
        • 8.3.1.1.1. By Value
      • 8.3.1.2. Market Share & Forecast
        • 8.3.1.2.1. By Component Type
        • 8.3.1.2.2. By End-Use Industry
    • 8.3.2. India Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 8.3.2.1. Market Size & Forecast
        • 8.3.2.1.1. By Value
      • 8.3.2.2. Market Share & Forecast
        • 8.3.2.2.1. By Component Type
        • 8.3.2.2.2. By End-Use Industry
    • 8.3.3. Japan Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 8.3.3.1. Market Size & Forecast
        • 8.3.3.1.1. By Value
      • 8.3.3.2. Market Share & Forecast
        • 8.3.3.2.1. By Component Type
        • 8.3.3.2.2. By End-Use Industry
    • 8.3.4. South Korea Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 8.3.4.1. Market Size & Forecast
        • 8.3.4.1.1. By Value
      • 8.3.4.2. Market Share & Forecast
        • 8.3.4.2.1. By Component Type
        • 8.3.4.2.2. By End-Use Industry
    • 8.3.5. Australia Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 8.3.5.1. Market Size & Forecast
        • 8.3.5.1.1. By Value
      • 8.3.5.2. Market Share & Forecast
        • 8.3.5.2.1. By Component Type
        • 8.3.5.2.2. By End-Use Industry

9. Middle East & Africa Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 9.1. Market Size & Forecast
    • 9.1.1. By Value
  • 9.2. Market Share & Forecast
    • 9.2.1. By Component Type
    • 9.2.2. By End-Use Industry
    • 9.2.3. By Country
  • 9.3. Middle East & Africa: Country Analysis
    • 9.3.1. Saudi Arabia Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 9.3.1.1. Market Size & Forecast
        • 9.3.1.1.1. By Value
      • 9.3.1.2. Market Share & Forecast
        • 9.3.1.2.1. By Component Type
        • 9.3.1.2.2. By End-Use Industry
    • 9.3.2. UAE Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 9.3.2.1. Market Size & Forecast
        • 9.3.2.1.1. By Value
      • 9.3.2.2. Market Share & Forecast
        • 9.3.2.2.1. By Component Type
        • 9.3.2.2.2. By End-Use Industry
    • 9.3.3. South Africa Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 9.3.3.1. Market Size & Forecast
        • 9.3.3.1.1. By Value
      • 9.3.3.2. Market Share & Forecast
        • 9.3.3.2.1. By Component Type
        • 9.3.3.2.2. By End-Use Industry

10. South America Extreme Ultraviolet (EUV) Lithography Market Outlook

  • 10.1. Market Size & Forecast
    • 10.1.1. By Value
  • 10.2. Market Share & Forecast
    • 10.2.1. By Component Type
    • 10.2.2. By End-Use Industry
    • 10.2.3. By Country
  • 10.3. South America: Country Analysis
    • 10.3.1. Brazil Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 10.3.1.1. Market Size & Forecast
        • 10.3.1.1.1. By Value
      • 10.3.1.2. Market Share & Forecast
        • 10.3.1.2.1. By Component Type
        • 10.3.1.2.2. By End-Use Industry
    • 10.3.2. Colombia Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 10.3.2.1. Market Size & Forecast
        • 10.3.2.1.1. By Value
      • 10.3.2.2. Market Share & Forecast
        • 10.3.2.2.1. By Component Type
        • 10.3.2.2.2. By End-Use Industry
    • 10.3.3. Argentina Extreme Ultraviolet (EUV) Lithography Market Outlook
      • 10.3.3.1. Market Size & Forecast
        • 10.3.3.1.1. By Value
      • 10.3.3.2. Market Share & Forecast
        • 10.3.3.2.1. By Component Type
        • 10.3.3.2.2. By End-Use Industry

11. Market Dynamics

  • 11.1. Drivers
  • 11.2. Challenges

12. Market Trends & Developments

  • 12.1. Merger & Acquisition (If Any)
  • 12.2. Product Launches (If Any)
  • 12.3. Recent Developments

13. Global Extreme Ultraviolet (EUV) Lithography Market: SWOT Analysis

14. Porter's Five Forces Analysis

  • 14.1. Competition in the Industry
  • 14.2. Potential of New Entrants
  • 14.3. Power of Suppliers
  • 14.4. Power of Customers
  • 14.5. Threat of Substitute Products

15. Competitive Landscape

  • 15.1. ASML Holding NV.
    • 15.1.1. Business Overview
    • 15.1.2. Products & Services
    • 15.1.3. Recent Developments
    • 15.1.4. Key Personnel
    • 15.1.5. SWOT Analysis
  • 15.2. CARL ZEISS AG.
  • 15.3. Toppan Photomasks Inc
  • 15.4. USHIO, INC
  • 15.5. NTT ADVANCED TECHNOLOGY CORPORATION.
  • 15.6. KLA CORPORATION
  • 15.7. ADVANTEST CORPORATION
  • 15.8. Photronics, Inc
  • 15.9. HOYA Corporation
  • 15.10. Trumpf

16. Strategic Recommendations

17. About Us & Disclaimer