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市場調查報告書
商品編碼
1930195
極紫外光刻 (EUV) 市場規模、佔有率、成長及全球產業分析:按類型、應用和地區劃分的洞察與預測 (2026-2034)EUV Lithography Market Size, Share, Growth and Global Industry Analysis By Type & Application, Regional Insights and Forecast to 2026-2034 |
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由於對先進半導體節點的需求不斷增長以及積體電路 (IC) 設計日益複雜,全球極紫外光微影 (EUV) 市場正經歷穩定成長。根據 Fortune Business Insights 的數據顯示,2025 年全球 EUV 光刻市場規模為 121.6 億美元。預計該市場將從 2026 年的 132.7 億美元成長到 2034 年的 250.8 億美元,預測期內複合年增長率 (CAGR) 為 8.28%。歐洲憑藉強大的半導體研發生態系統和主要EUV技術供應商的存在,引領市場,預計到2025年將佔全球市場44.71%的佔有率。
EUV微影技術利用極紫外線(EUV)光在半導體晶圓上蝕刻出極為精細的圖案,從而能夠生產7奈米以下的晶片。這項技術對於維持摩爾定律至關重要,因為它能夠提高現代處理器的電晶體密度、效能和能源效率。
生成式人工智慧對EUV微影市場的影響
生成式人工智慧透過增強圖案優化、缺陷檢測和設計自動化,在改進EUV光刻製程方面發揮關鍵作用。透過分析來自以往製造週期的大量資料集,人工智慧模型可以產生優化的光刻圖案,從而減少缺陷、提高良率並最大限度地減少生產過程中的試錯。這些進步顯著提高了製程精度和產量,從而推動了全球EUV微影市場的成長。
市場動態
市場驅動因素
積體電路日益複雜是推動EUV微影技術普及的主要驅動力。隨著半導體製造商不斷縮小裝置尺寸並提高電晶體密度,傳統光學微影技術難以滿足解析度要求。 EUV微影技術能夠實現高精度圖案化,對於先進的邏輯晶片和儲存晶片至關重要。人工智慧、5G、資料中心和消費性電子等各領域對高效能晶片的需求不斷增長,持續推動市場成長。
市場限制因子
儘管EUV微影技術具有諸多優勢,但其高昂的成本仍是一個重大障礙。由於光源、掩模、薄膜和光阻等組件的複雜性,EUV設備比傳統光刻設備昂貴得多。此外,掩模保護和工業規模化實施的技術挑戰進一步推高了實施成本,限制了中小半導體製造商採用此技術。
市場機會
資料中心和先進儲存設備的快速擴張帶來了巨大的成長機會。 EUV微影技術支援高密度NAND快閃記憶體和DRAM記憶體的生產,這些記憶體是現代運算、雲端基礎架構和企業儲存所必需的。對高速、高能源效率記憶體的需求不斷增長,預計將進一步推動EUV技術的應用。
EUV微影市場趨勢
影響市場的一個顯著趨勢是對先進半導體節點(尤其是5nm以下節點)的需求不斷增長。三星和台積電等主要半導體公司正在擴大EUV產能,以支援下一代晶片的生產。這種對小型化和性能提升的關注是市場持續發展的關鍵驅動力。
依裝置類型
光源細分市場由於其在實現10奈米以下圖形化方面發揮的關鍵作用,預計到2026年將佔最大的市場佔有率,達到41.26%。持續的技術創新、政府對半導體研發的支持以及製造商之間的合作正在推動該細分市場的成長。
由於7奈米以下晶片製造對精度要求的不斷提高,預計掩模細分市場在預測期內將實現最高的複合年增長率。
按最終使用者
整合裝置製造商 (IDM) 細分市場佔主導地位,預計到2026年將佔53.92%的市場佔有率,因為IDM擴大採用EUV光刻技術來克服功耗、性能和麵積方面的限制。
代工細分市場預計將以12.27%的最高複合年增長率成長,這主要受人工智慧、智慧型手機、汽車和高效能運算應用領域對先進半導體的需求日益增長所推動。
在半導體製造領域強勁投資的推動下,歐洲預計將保持領先地位,2025年市場規模將達到54.4億美元,2026年將達到60.2億美元。德國預計2026年市場規模將達到13.9億美元,而法國2025年的市場規模將達到11.1億美元。
亞太地區是第二大市場,預計2026年市場規模將達37.3億美元,複合年增長率最高,為12.34%,主要得益於中國大陸、台灣和韓國的主要晶圓代工廠。
北美市場預計2026年將達到18.9億美元,主要受先進計算和通訊設備需求的推動。
預計到 2026 年,中東和非洲市場規模將達到 9.6 億美元,而海灣合作委員會 (GCC) 市場在 2025 年的估值為 2.9 億美元。
The global extreme ultraviolet (EUV) lithography market is experiencing steady growth due to rising demand for advanced semiconductor nodes and increasing complexity in integrated circuit (IC) designs. According to Fortune Business Insights, the global EUV lithography market size was valued at USD 12.16 billion in 2025. The market is projected to grow from USD 13.27 billion in 2026 to USD 25.08 billion by 2034, registering a compound annual growth rate (CAGR) of 8.28% during the forecast period. Europe dominated the global market, accounting for 44.71% of the total market share in 2025, supported by a strong semiconductor R&D ecosystem and the presence of leading EUV technology providers.
EUV lithography uses extreme ultraviolet light to etch extremely small patterns onto semiconductor wafers, enabling the production of chips below 7 nanometers. This technology is essential for sustaining Moore's Law by increasing transistor density, performance, and energy efficiency in modern processors.
Impact of Generative AI on the EUV Lithography Market
Generative AI is playing a crucial role in improving EUV lithography processes by enhancing pattern optimization, defect detection, and design automation. By analyzing large datasets from prior manufacturing cycles, AI models generate optimized lithography patterns that reduce defects, improve yields, and minimize trial-and-error during production. These advancements significantly enhance process precision and throughput, thereby supporting the growth of the EUV lithography market globally.
Market Dynamics
Market Drivers
The rising complexity of integrated circuits is a key driver of EUV lithography adoption. As semiconductor manufacturers shift toward smaller feature sizes and higher transistor densities, traditional optical lithography struggles to meet resolution requirements. EUV lithography enables highly precise patterning, making it indispensable for advanced logic and memory chips. The growing demand for high-performance chips across applications such as artificial intelligence, 5G, data centers, and consumer electronics continues to fuel market growth.
Market Restraints
Despite its advantages, the high cost of EUV lithography systems remains a significant barrier. EUV tools are considerably more expensive than conventional lithography equipment due to complex components such as light sources, masks, pellicles, and photoresists. Additionally, technical challenges related to mask protection and industrial-scale deployment further increase implementation costs, limiting adoption among smaller semiconductor manufacturers.
Market Opportunities
The rapid expansion of data centers and advanced memory devices presents a major growth opportunity. EUV lithography supports the production of high-density NAND Flash and DRAM memory required for modern computing, cloud infrastructure, and enterprise storage. As demand for faster and energy-efficient memory rises, EUV technology is expected to gain further traction.
EUV Lithography Market Trends
A prominent trend shaping the market is the increasing demand for advanced semiconductor nodes, particularly 5nm and below. Leading semiconductor companies such as Samsung and TSMC are expanding their EUV capacity to support next-generation chip production. This focus on miniaturization and performance enhancement is a key factor driving sustained market progress.
By Equipment Type
The light source segment held the largest market share of 41.26% in 2026, driven by its critical role in enabling sub-10 nanometer patterning. Continuous innovations, government support for semiconductor R&D, and collaborations among manufacturers are supporting segment growth.
The mask segment is expected to record the highest CAGR during the forecast period due to increasing precision requirements in sub-7 nanometer chip manufacturing.
By End-User
The Integrated Device Manufacturer (IDM) segment dominated the market and is projected to capture 53.92% market share in 2026, as IDMs increasingly adopt EUV lithography to overcome power, performance, and area limitations.
The foundries segment is expected to grow at the highest CAGR of 12.27%, driven by rising demand for advanced semiconductors used in AI, smartphones, automotive, and high-performance computing applications.
Europe led the market with a valuation of USD 5.44 billion in 2025 and USD 6.02 billion in 2026, supported by strong investments in semiconductor manufacturing. Germany is projected to reach USD 1.39 billion in 2026, while France is valued at USD 1.11 billion in 2025.
Asia Pacific is the second-largest market, estimated at USD 3.73 billion in 2026, with the highest CAGR of 12.34%, driven by major foundries in China, Taiwan, and South Korea.
North America is projected to reach USD 1.89 billion in 2026, supported by demand for advanced computing and telecom devices.
The Middle East & Africa market is estimated to reach USD 0.96 billion in 2026, while the GCC market is valued at USD 0.29 billion in 2025.
Conclusion
In conclusion, the global EUV lithography market is set for steady growth from USD 12.16 billion in 2025 to USD 25.08 billion by 2034, driven by increasing semiconductor complexity, rising demand for advanced nodes, and expanding data center infrastructure. While high costs and technical challenges remain, continuous innovations, generative AI integration, and strong investments by key players such as ASML are expected to strengthen EUV lithography's role as a cornerstone technology in next-generation semiconductor manufacturing.
Segmentation By Equipment
By End-user
By Region
Companies Profiled in the Report ASML (Netherlands), Samsung Electronics Co. Ltd. (South Korea), Canon Inc. (Japan), KLA Corporation (U.S.), NTT Advanced Technology Corporation (Japan), Nikon Corporation (China), ZEISS Group (Germany), ADVANTEST CORPORATION (Japan), SUSS MicroTec SE (Germany)