查看購物車
  • English
  • Japanese
極紫外線（EUV）微影術市場：按組件、系統類型、最終用戶、應用和地區分類的全球市場－預測至2032年
市場調查報告書
商品編碼
1931746

極紫外線（EUV）微影術市場：按組件、系統類型、最終用戶、應用和地區分類的全球市場－預測至2032年

Extreme Ultraviolet (EUV) Lithography Market by Component (Light Sources, Optics, Masks), System Type (0.33 NA EUV System (NXE), 0.55 NA EUV System (EXE)), Integrated Device Manufacturers, Foundries, Logic Chips, Memory Chips - Global Forecast to 2032
出版日期: | 出版商: MarketsandMarkets | 英文 206 Pages | 訂單完成後即時交付

價格

全球極紫外線（EUV）微影術市場預計將從 2026 年的 158.4 億美元成長到 2032 年的 303.6 億美元，複合年成長率為 11.4%。

智慧型手機、穿戴式裝置、平板電腦和遊戲設備等家用電子電器的快速發展，持續推動對先進半導體晶片的需求，這些晶片能夠實現更高的性能、更小的尺寸和更高的能源效率。為了實現更快的處理速度、更先進的圖形處理能力和更長的電池續航時間，製造商越來越依賴極微影術（EUV），該技術能夠製造更小的電晶體並實現更高的電晶體密度。

調查範圍
調查期 2021-2032
基準年 2024
預測期 2025-2032
目標單元 金額（十億美元）
部分 按組件、按系統類型、按最終用戶、按應用程式、按區域
目標區域 北美、歐洲、亞太地區及其他地區

向折疊式顯示器、擴增實境(AR) 和虛擬實境 (VR) 等下一代技術的演進，進一步增加了晶片的複雜性，並強化了對基於極紫外光刻 (EUV) 的精密製造流程的需求。隨著家用電子電器和自動駕駛應用對效能和小型化的需求不斷成長，EUV微影術已成為在先進節點上生產可靠、高性能積體電路的關鍵技術。

極紫外線（EUV）微影市場-IMG1

由於光源對先進半導體製程的系統生產率、吞吐量和成本效益有直接影響，預計將在極紫外 (EUV)微影術市場中實現最高的複合年成長率 (CAGR)。對晶圓吞吐量不斷成長的需求促使人們需要更強大的 EUV 光源功率、更高的穩定性和更長的正常運作，從而推動現有光源模組的頻繁升級和更換。此外，向更先進的製程節點過渡以及逐步向下一代 EUV 平台的轉變，也提高了對光源性能的要求，加速了研發投入和應用。與其他 EUV 系統組件相比，光源組件的高技術複雜性、有限的供應商基礎以及對提高生產率的高度重視，都支撐著其更快的收入成長。

2025年，邏輯晶片在極紫外線（EUV）微影術應用領域佔據最大市場佔有率，這主要得益於EUV技術在先進製程節點上的早期和廣泛應用。諸如7nm、5nm和3nm等尖端邏輯裝置需要極精細的圖形化、嚴格的套刻控制和高電晶體密度，而與多重圖形化的深紫外線（DUV）技術相比，EUV能夠更有效率地實現這些目標。人工智慧、高效能運算、資料中心和先進汽車電子等應用領域的快速成長，推動了對高性能邏輯晶片的強勁需求，並加速了EUV設備利用率和產能的擴張。同時，記憶體製造商正更有選擇性地採用EUV技術，專注於特定層，這進一步鞏固了邏輯晶片在極紫外線（EUV）微影術整體需求中的主導地位。

亞太地區預計將在預測期內實現最高的複合年成長率，這主要得益於該地區主要半導體晶圓代工廠和整合裝置製造商 (IDM) 的集中，以及對先進節點製造的持續投資。該地區的領先地位得益於 5nm、3nm 和 3nm 以下製程的大規模產能擴張，人工智慧、高效能運算和先進消費性電子產品對邏輯晶片日益成長的需求，以及成熟的半導體供應鏈加速了 EUV 微影技術的應用。此外，持續的資本投資、積極的技術藍圖以及政府主導的加強國內半導體能力的舉措，都在加速 EUV 設備的普及。這些因素共同促成了亞太地區成為全球極紫外線 (EUV)微影術市場的主要需求中心和成長引擎。

主要調查主題細分

我們對在極紫外線 (EUV)微影術市場中營運的主要組織的高階主管（執行長、市場總監、創新與技術總監等）進行了深入訪談。

極紫外線 (EUV)微影術市場由 ASML（荷蘭）主導，ASML 是 EUV微影術產品的唯一製造商。此外，TRUMPF（德國）、Ushio Inc.（日本）、Energetiq（美國）、蔡司集團（德國）、NTT 先進技術公司（日本）、理學控股公司（日本）、Edmund Optics Inc.（美國）、AGC Inc.（日本）、Tekscend Photomasks（日本）、Lasertec Corporation（日本）、HOntec Corporation（日本）、NserService Corporation（日本）、3333 年）。 Corporation（美國）、ADVANTEST CORPORATION（日本）、SUSS MicroTec SE（德國）、Applied Materials, Inc.（美國）、Park Systems（韓國）、Imagine Optic（法國）、MKS Inc.（美國）、台積電（台灣）、英特爾公司（美國）、三星（韓國）、SK 製造商）佔據了美光公司（韓國市場）。本研究對極紫外線（EUV）微影術市場的主要企業進行了詳細的競爭分析，包括公司簡介、近期發展和關鍵市場策略。

調查範圍

本報告對極紫外線 (EUV)微影術市場進行了細分，並按組件、系統類型、最終用戶、應用和地區提供了預測。報告也探討了與該市場相關的促進因素、限制因素、機會和挑戰。報告詳細分析了美洲、亞太地區和歐洲、中東及非洲 (EMEA) 三大主要地區的市場情況，並包含了主要參與者的價值鏈分析和 EUV微影術生態系統分析。

購買本報告的主要優勢

  • 分析影響極紫外線（ 微影術的關鍵促進因素（領先代晶圓代工廠微影術快速採用EUV微影術技術）、限制因素（高額初始資本投資）、機會（對先進EUV微影術和半導體元件的投資不斷增加）以及挑戰（來自其他微影技術的競爭）。
  • 產品、解決方案與服務開發與創新：深入了解EUV微影術市場即將推出的組件、技術與研發活動
  • 市場發展：關於盈利市場的全面資訊－本報告分析了各個地區的極紫外線（EUV）微影術市場。
  • 市場多元化：全面介紹前沿地區新興的極微影術技術、近期趨勢以及極微影術市場的投資情況。
  • 競爭評估：對為 EUV微影術提供組件的主要企業（包括 KLA 公司（美國）、蔡司集團（德國）、通快公司（德國）、AGC 公司（日本）和 Lasertec 公司（日本））的市場佔有率、成長策略和產品供應進行詳細評估。

目錄

第1章 引言

第2章執行摘要

第3章重要考察

第4章 市場概覽

  • 市場動態
    • 促進要素
    • 抑制因素
    • 機會
    • 任務

第5章 產業趨勢

  • 波特五力分析
  • 宏觀經濟展望
  • 價值鏈分析
  • 生態系分析
  • 定價分析
  • 貿易分析
  • 2026-2027 年主要會議和活動
  • 影響客戶業務的趨勢/干擾因素
  • 投資和資金籌措方案
  • 案例研究分析
  • 2025年美國關稅對極紫外線（EUV）微影術市場的影響

第6章：技術進步、人工智慧的影響、專利與創新

  • 技術分析
  • 技術/產品藍圖
  • 專利分析
  • 人工智慧對極微影術的影響

第7章 監理環境

  • 監管機構、政府機構和其他組織
  • 規則
  • 標準
  • 政府法規
  • 永續性影響和監管政策舉措
  • 認證、標籤和環境標準

第8章：顧客狀況與購買行為

  • 決策流程
  • 主要相關人員和採購標準
  • 招募障礙和內部挑戰
  • 各類終端用戶的未滿足需求
  • 市場盈利

第9章 極紫外線（EUV）微影術技術應用節點

  • 7NM
  • 5NM
  • 3NM
  • 2NM
  • 小於2海裡

10. 極紫外線（EUV）微影術市場（依組件分類）

  • 光源
  • 光學
  • 面具
  • 其他

11. 極紫外線 (EUV)微影術市場（依系統類型分類）

  • 0.33 NA EUV 系統 (NXE)
  • 0.55 NA EUV 系統 (EXE)

第12章 依最終用戶分類的極紫外線（EUV）微影術市場

  • 整合裝置製造商（IDMS）
  • 鑄造廠

第13章 依應用分類的極紫外線（EUV）微影術市場

  • 邏輯晶片
  • 記憶體晶片

14. 極紫外線（EUV）微影術市場（依地區分類）

  • 美洲
  • EMEA
  • 亞太地區

第15章 競爭格局

  • 概述
  • 主要參與企業的競爭策略/優勢，2024-2025年
  • 2021-2025年收入分析
  • 2025年市佔率分析
  • 估值和財務指標
  • 產品對比
  • 公司估值矩陣：主要參與企業，2025 年
  • 公司估值矩陣：Start-Ups/中小企業，2025 年
  • 競爭場景

第16章：公司簡介

  • 主要系統製造商
    • ASML
  • 主要零件製造商
    • LIGHT SOURCE MANUFACTURERS
    • OPTICS MANUFACTURERS
    • MASK MANUFACTURERS
    • 其他
  • 最終用戶
    • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
    • INTEL CORPORATION
    • SAMSUNG
    • SK HYNIX INC.
    • MICRON TECHNOLOGY, INC.

第17章調查方法

第18章附錄

Product Code: SE 6398

The global extreme ultraviolet (EUV) lithography market is expected to grow from USD 15.84 billion in 2026 to USD 30.36 billion by 2032, at a CAGR of 11.4%. The rapid advancements in consumer electronics, including smartphones, wearables, tablets, and gaming devices, are driving sustained demand for advanced semiconductor chips that offer higher performance, compact designs, and improved energy efficiency. To support faster processing, enhanced graphics, and longer battery life, manufacturers increasingly rely on EUV lithography to enable smaller transistors and higher transistor density.

Scope of the Report
Years Considered for the Study2021-2032
Base Year2024
Forecast Period2025-2032
Units ConsideredValue (USD Billion)
SegmentsBy Component, System Type, End User and Region
Regions coveredNorth America, Europe, APAC, RoW

The shift toward next-generation technologies, including foldable displays, augmented reality, and virtual reality, is further increasing chip complexity and reinforcing the need for high-precision EUV-based manufacturing. As performance and miniaturization requirements continue to rise across consumer electronics and autonomous applications, EUV lithography is becoming a critical enabler for producing reliable, high-performance integrated circuits at advanced nodes.

Extreme Ultraviolet (EUV) Lithography Market - IMG1

"Light sources to exhibit highest CAGR from 2026 to 2032."

Light sources are expected to witness the highest CAGR in the extreme ultraviolet (EUV) lithography market due to their direct impact on system productivity, throughput, and cost efficiency at advanced semiconductor nodes. Continuous demand for higher wafer throughput is driving the need for increased EUV source power, improved stability, and longer uptime, prompting frequent upgrades and replacements of existing light source modules. In addition, the transition toward more advanced process nodes and the gradual shift to next-generation EUV platforms are increasing performance requirements for light sources, accelerating R&D investments and adoption. The high technical complexity, limited supplier base, and strong focus on productivity-driven enhancements further support faster revenue growth for this component compared to other EUV system elements.

"Logic chips held largest share of extreme ultraviolet (EUV) lithography market in 2025."

Logic chips held the largest market share in the application segment of the extreme ultraviolet (EUV) lithography market in 2025, driven by early and widespread adoption of EUV at advanced process nodes. Leading-edge logic devices at 7 nm, 5 nm, and 3 nm require extremely fine patterning, tight overlay control, and high transistor density, all of which are more efficiently achieved using EUV compared with multi-patterning DUV techniques. The rapid growth of applications such as artificial intelligence, high-performance computing, data centers, and advanced automotive electronics is driving strong demand for high-performance logic chips, accelerating EUV tool utilization and capacity expansion. In contrast, memory manufacturers have adopted EUV more selectively, focusing on specific layers, which further reinforces the dominance of logic chips in overall extreme ultraviolet (EUV) lithography demand.

"Asia Pacific to be fastest-growing regional market for EUV lithography from 2026 to 2032."

Asia Pacific is expected to register the highest CAGR during the forecast period, driven by its strong concentration of leading semiconductor foundries and integrated device manufacturers (IDMs), as well as continuous investments in advanced-node manufacturing. The region's dominance is supported by large-scale capacity expansions at 5 nm, 3 nm, and sub-3 nm nodes, rising demand for logic chips used in AI, high-performance computing, and advanced consumer electronics, and a mature semiconductor supply chain that enables rapid EUV adoption. In addition, sustained capital expenditure, aggressive technology roadmaps, and government-backed initiatives to strengthen domestic semiconductor capabilities are accelerating EUV tool installations. These factors collectively position Asia Pacific as the primary demand center and growth engine for the global extreme ultraviolet (EUV) lithography market.

Breakdown of Primaries

Various executives from key organizations operating in the extreme ultraviolet (EUV) lithography market were interviewed in-depth, including CEOs, marketing directors, and innovation and technology directors.

  • By Company Type: Tier 1-30%, Tier 2-50%, and Tier 3-20%
  • By Designation: C-level Executives-25%, Directors-35%, and Others-40%
  • By Region: Asia Pacific-40%, Americas-25%, and EMEA- 35%

The extreme ultraviolet (EUV) lithography market is dominated by ASML (Netherlands) as the sole manufacturer of EUV lithography products, as well as by component manufacturers such as TRUMPF (Germany), Ushio Inc. (Japan), Energetiq (US), Zeiss Group (Germany), NTT Advanced Technology Corporation (Japan), Rigaku Holdings Corporation (Japan), Edmund Optics Inc. (US), AGC Inc. (Japan), Tekscend Photomask (Japan), Lasertec Corporation (Japan), HOYA Corporation (Japan), NuFlare Technology, Inc. (Japan), KLA Corporation (US), ADVANTEST CORPORATION (Japan), SUSS MicroTec SE (Germany), Applied Materials, Inc. (US), Park Systems (South Korea), Imagine Optic (France), MKS Inc. (US), Taiwan Semiconductor Manufacturing Company Limited (TSMC) (Taiwan), Intel Corporation (US), Samsung (South Korea), SK HYNIX INC. (South Korea), and Micron Technology (US). The study includes an in-depth competitive analysis of these key players in the extreme ultraviolet (EUV) lithography market, with their company profiles, recent developments, and key market strategies.

Study Coverage

The report segments the extreme ultraviolet (EUV) lithography market and forecasts its components, system types, end users, applications, and regions. The report also discusses the drivers, restraints, opportunities, and challenges pertaining to the market. It provides a detailed view of the market across three main regions-Americas, Asia Pacific, and EMEA. The report includes a value chain analysis of the key players and their competitive analysis of the EUV lithography ecosystem.

Key Benefits of Buying the Report

  • Analysis of key drivers (surging deployment of EUV lithography across leading-edge foundry nodes), restraints (high upfront capital investment), opportunities (increasing investments in advanced EUV lithography and semiconductor devices), and challenges (competition from alternative lithography techniques) influencing the growth of the extreme ultraviolet (EUV) lithography market
  • Products/Solution/Service Development/Innovation: Detailed insights into upcoming components, technologies, research, and development activities in the extreme ultraviolet (EUV) lithography market
  • Market Development: Comprehensive information about lucrative markets-the report analyzes the extreme ultraviolet (EUV) lithography market across varied regions
  • Market Diversification: Exhaustive information about new EUV lithography in untapped geographies, recent developments, and investments in the extreme ultraviolet (EUV) lithography market
  • Competitive Assessment: In-depth assessment of market shares and growth strategies, and offerings of leading players offering components of EUV lithography, such as KLA Corporation (US), ZEISS Group (Germany), TRUMPF (Germany), AGC Inc. (Japan), and Lasertec Corporation (Japan)

TABLE OF CONTENTS

1 INTRODUCTION

  • 1.1 STUDY OBJECTIVES
  • 1.2 MARKET DEFINITION
  • 1.3 STUDY SCOPE
    • 1.3.1 MARKETS COVERED AND REGIONAL SCOPE
    • 1.3.2 INCLUSIONS AND EXCLUSIONS
    • 1.3.3 YEARS CONSIDERED
  • 1.4 CURRENCY CONSIDERED
  • 1.5 UNIT CONSIDERED
  • 1.6 LIMITATIONS
  • 1.7 STAKEHOLDERS
  • 1.8 SUMMARY OF CHANGES

2 EXECUTIVE SUMMARY

  • 2.1 MARKET HIGHLIGHTS AND KEY INSIGHTS
  • 2.2 KEY MARKET PARTICIPANTS: MAPPING OF STRATEGIC DEVELOPMENTS
  • 2.3 DISRUPTIVE TRENDS IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET
  • 2.4 HIGH-GROWTH SEGMENTS
  • 2.5 REGIONAL SNAPSHOT: MARKET SIZE, GROWTH RATE, AND FORECAST

3 PREMIUM INSIGHTS

  • 3.1 ATTRACTIVE OPPORTUNITIES FOR PLAYERS IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET
  • 3.2 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER
  • 3.3 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY APPLICATION
  • 3.4 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION

4 MARKET OVERVIEW

  • 4.1 INTRODUCTION
  • 4.2 MARKET DYNAMICS
    • 4.2.1 DRIVERS
      • 4.2.1.1 Surging deployment of EUV lithography across leading-edge foundry nodes
      • 4.2.1.2 Elevating use of AI accelerators and deep learning processors in HPC systems
      • 4.2.1.3 Increasing complexity of integrated circuits
      • 4.2.1.4 Rapid advancements in consumer electronics
    • 4.2.2 RESTRAINTS
      • 4.2.2.1 High upfront capital investment
      • 4.2.2.2 Requirement for advanced infrastructure and skilled workforce
    • 4.2.3 OPPORTUNITIES
      • 4.2.3.1 Increasing investments in advanced EUV lithography and semiconductor devices
      • 4.2.3.2 Emerging applications of EUV lithography
      • 4.2.3.3 Advancements in memory modules and chips
      • 4.2.3.4 Integration of EUV lithography into advanced display manufacturing
      • 4.2.3.5 Application of advanced patterning technologies in photonics and optics production
      • 4.2.3.6 Commercialization of High-NA EUV lithography
    • 4.2.4 CHALLENGES
      • 4.2.4.1 Competition from alternative lithography techniques
      • 4.2.4.2 Difficulty in sustaining high source power and productivity
      • 4.2.4.3 Detecting and addressing mask defects and yield-related challenges

5 INDUSTRY TRENDS

  • 5.1 INTRODUCTION
  • 5.2 PORTER'S FIVE FORCES ANALYSIS
    • 5.2.1 INTENSITY OF COMPETITIVE RIVALRY
    • 5.2.2 THREAT OF NEW ENTRANTS
    • 5.2.3 THREAT OF SUBSTITUTES
    • 5.2.4 BARGAINING POWER OF BUYERS
    • 5.2.5 BARGAINING POWER OF SUPPLIERS
  • 5.3 MACROECONOMIC OUTLOOK
    • 5.3.1 INTRODUCTION
    • 5.3.2 GDP TRENDS AND FORECAST
    • 5.3.3 TRENDS IN FOUNDRIES
    • 5.3.4 TRENDS IN INTEGRATED DEVICE MANUFACTURERS (IDMS)
  • 5.4 VALUE CHAIN ANALYSIS
    • 5.4.1 R&D ENGINEERS
    • 5.4.2 RAW MATERIAL PROVIDERS AND COMPONENT MANUFACTURERS
    • 5.4.3 SYSTEM INTEGRATORS AND MANUFACTURERS
    • 5.4.4 MARKETING & SALES SERVICES PROVIDERS
    • 5.4.5 END USERS
  • 5.5 ECOSYSTEM ANALYSIS
  • 5.6 PRICING ANALYSIS
    • 5.6.1 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM TYPES, BY KEY PLAYER, 2021-2025
    • 5.6.2 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM, BY REGION, 2021-2025
  • 5.7 TRADE ANALYSIS
    • 5.7.1 IMPORT SCENARIO (HS CODE 8442)
    • 5.7.2 EXPORT SCENARIO (HS CODE 8442)
  • 5.8 KEY CONFERENCES AND EVENTS, 2026-2027
  • 5.9 TRENDS/DISRUPTIONS IMPACTING CUSTOMER BUSINESS
  • 5.10 INVESTMENT AND FUNDING SCENARIO
  • 5.11 CASE STUDY ANALYSIS
    • 5.11.1 INTEL SECURES EXCLUSIVE HIGH-NA EUV LITHOGRAPHY MACHINES TO RESHAPE SUPPLY CHAIN
    • 5.11.2 TSMC DEPLOYS EUV LITHOGRAPHY SYSTEMS TO BOOST PRODUCTION CAPACITY
    • 5.11.3 SAMSUNG ELECTRONICS ADVANCES 3 NM GAA PRODUCTION USING EUV LITHOGRAPHY
  • 5.12 IMPACT OF 2025 US TARIFF ON EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET
    • 5.12.1 INTRODUCTION
    • 5.12.2 KEY TARIFF RATES
    • 5.12.3 PRICE IMPACT ANALYSIS
    • 5.12.4 IMPACT ON COUNTRY/REGION
      • 5.12.4.1 US
      • 5.12.4.2 Europe
      • 5.12.4.3 Asia Pacific
    • 5.12.5 IMPACT ON END USERS

6 TECHNOLOGICAL ADVANCEMENTS, AI-DRIVEN IMPACT, PATENTS, AND INNOVATIONS

  • 6.1 TECHNOLOGY ANALYSIS
    • 6.1.1 KEY EMERGING TECHNOLOGIES
      • 6.1.1.1 High-NA EUV lithography technology
      • 6.1.1.2 Advanced EUV resist and patterning materials
    • 6.1.2 COMPLEMENTARY TECHNOLOGIES
      • 6.1.2.1 Mask pellicles
      • 6.1.2.2 Plasma generation
    • 6.1.3 ADJACENT TECHNOLOGIES
      • 6.1.3.1 Extreme ultraviolet reflectometry (EUVR)
      • 6.1.3.2 Atomic layer deposition (ALD)
  • 6.2 TECHNOLOGY/PRODUCT ROADMAP
    • 6.2.1 SHORT-TERM (2025-2027): PRODUCTIVITY OPTIMIZATION & ADVANCED NODE SCALING
    • 6.2.2 MID-TERM (2027-2030): HIGH-NA EUV COMMERCIALIZATION & PROCESS MATURITY
    • 6.2.3 LONG-TERM (2030-2035+): FULL HIGH-NA DEPLOYMENT & NEXT-GEN LITHOGRAPHY INTEGRATION
  • 6.3 PATENT ANALYSIS
  • 6.4 IMPACT OF AI ON EUV LITHOGRAPHY
    • 6.4.1 TOP USE CASES AND MARKET POTENTIAL
    • 6.4.2 BEST PRACTICES IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET
    • 6.4.3 CASE STUDIES OF AI IMPLEMENTATION IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET
    • 6.4.4 INTERCONNECTED/ADJACENT ECOSYSTEM AND IMPACT ON MARKET PLAYERS
    • 6.4.5 CLIENTS' READINESS TO ADOPT AI IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET

7 REGULATORY LANDSCAPE

  • 7.1 INTRODUCTION
  • 7.2 REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
  • 7.3 REGULATIONS
  • 7.4 STANDARDS
    • 7.4.1 SEMI STANDARDS
    • 7.4.2 ISO & IEC ELECTRICAL, MECHANICAL, AND SAFETY STANDARDS
    • 7.4.3 ISO 9001:2015 QUALITY MANAGEMENT SYSTEM STANDARDS
    • 7.4.4 ISO 14001 ENVIRONMENTAL MANAGEMENT STANDARDS
    • 7.4.5 ROHS & REACH COMPLIANCE STANDARDS
    • 7.4.6 CYBERSECURITY & DATA INTEGRITY STANDARDS
  • 7.5 GOVERNMENT REGULATIONS
    • 7.5.1 US
    • 7.5.2 EUROPE
    • 7.5.3 CHINA
    • 7.5.4 JAPAN
    • 7.5.5 INDIA
  • 7.6 SUSTAINABILITY IMPACT AND REGULATORY POLICY INITIATIVES
  • 7.7 CERTIFICATIONS, LABELING, AND ECO-STANDARDS

8 CUSTOMER LANDSCAPE AND BUYER BEHAVIOR

  • 8.1 DECISION-MAKING PROCESS
  • 8.2 KEY STAKEHOLDERS AND BUYING CRITERIA
    • 8.2.1 KEY STAKEHOLDERS IN BUYING PROCESS
    • 8.2.2 BUYING CRITERIA
  • 8.3 ADOPTION BARRIERS AND INTERNAL CHALLENGES
  • 8.4 UNMET NEEDS OF VARIOUS END USERS
  • 8.5 MARKET PROFITABILITY

9 APPLICATION NODES OF EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY TECHNOLOGY

  • 9.1 INTRODUCTION
  • 9.2 7 NM
  • 9.3 5 NM
  • 9.4 3 NM
  • 9.5 2 NM
  • 9.6 SUB-2 NM

10 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY COMPONENT

  • 10.1 INTRODUCTION
  • 10.2 LIGHT SOURCES
    • 10.2.1 RISING FOCUS ON ENHANCING PRECISION AND THROUGHPUT IN SEMICONDUCTORS TO BOOST DEMAND
  • 10.3 OPTICS
    • 10.3.1 ELEVATING DEMAND FOR HIGHER NUMERICAL APERTURE (HIGH-NA) EUV SYSTEMS TO SUPPORT SEGMENTAL GROWTH
  • 10.4 MASKS
    • 10.4.1 GREATER EMPHASIS ON PROCESS EFFICIENCY AND SUSTAINABILITY IN EUV MASK PRODUCTION TO CONTRIBUTE TO SEGMENTAL GROWTH
  • 10.5 OTHER COMPONENTS

11 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY SYSTEM TYPE

  • 11.1 INTRODUCTION
  • 11.2 0.33 NA EUV SYSTEMS (NXE)
    • 11.2.1 COST EFFICIENCY AND RELIABILITY TO STIMULATE DEMAND
  • 11.3 0.55 NA EUV SYSTEMS (EXE)
    • 11.3.1 ABILITY TO IMPROVE YIELD FOR ADVANCED LOGIC, MEMORY, AND AI CHIPS TO DRIVE MARKET

12 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER

  • 12.1 INTRODUCTION
  • 12.2 INTEGRATED DEVICE MANUFACTURERS (IDMS)
    • 12.2.1 INNOVATION IN ADVANCED AND ENERGY-EFFICIENT MICROCHIPS TO FOSTER MARKET GROWTH
  • 12.3 FOUNDRIES
    • 12.3.1 STRONG FOCUS ON HIGH-VOLUME SEMICONDUCTOR MANUFACTURING TO SUPPORT SEGMENTAL GROWTH

13 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY APPLICATION

  • 13.1 INTRODUCTION
  • 13.2 LOGIC CHIPS
    • 13.2.1 INCREASING COMPLEXITY AND COSTS OF LOGIC DEVICES TO BOOST DEMAND FOR EUV LITHOGRAPHY
    • 13.2.2 CPU
    • 13.2.3 GPU
    • 13.2.4 AI ACCELERATOR
    • 13.2.5 SOC
    • 13.2.6 ASIC
  • 13.3 MEMORY CHIPS
    • 13.3.1 GROWING DEMAND FOR ARTIFICIAL INTELLIGENCE, CLOUD COMPUTING, AND HIGH-PERFORMANCE APPLICATIONS TO CREATE OPPORTUNITIES
    • 13.3.2 DRAM
    • 13.3.3 HBM

14 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION

  • 14.1 INTRODUCTION
  • 14.2 AMERICAS
    • 14.2.1 GROWING DEMAND FOR HIGH-PERFORMANCE, ENERGY-EFFICIENT SEMICONDUCTOR SOLUTIONS TO BOOST MARKET
  • 14.3 EMEA
    • 14.3.1 EARLY-STAGE COMMERCIALIZATION OF EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY TO CREATE GROWTH OPPORTUNITIES
  • 14.4 ASIA PACIFIC
    • 14.4.1 CHINA
      • 14.4.1.1 Domestic semiconductor capacity building and technology localization to drive market
    • 14.4.2 JAPAN
      • 14.4.2.1 Presence of leading technology providers to contribute to market growth
    • 14.4.3 SOUTH KOREA
      • 14.4.3.1 Strong global position in memory and logic semiconductor manufacturing to foster market growth
    • 14.4.4 TAIWAN
      • 14.4.4.1 Significant investments in eco-friendly EUV system components to propel market
    • 14.4.5 REST OF ASIA PACIFIC

15 COMPETITIVE LANDSCAPE

  • 15.1 OVERVIEW
  • 15.2 KEY PLAYER COMPETITIVE STRATEGIES/RIGHT TO WIN, 2024-2025
  • 15.3 REVENUE ANALYSIS, 2021-2025
  • 15.4 MARKET SHARE ANALYSIS, 2025
  • 15.5 COMPANY VALUATION AND FINANCIAL METRICS
    • 15.5.1 COMPANY VALUATION
    • 15.5.2 FINANCIAL METRICS
  • 15.6 PRODUCT COMPARISON
  • 15.7 COMPANY EVALUATION MATRIX: KEY PLAYERS, 2025
    • 15.7.1 STARS
    • 15.7.2 EMERGING LEADERS
    • 15.7.3 PERVASIVE PLAYERS
    • 15.7.4 PARTICIPANTS
    • 15.7.5 COMPANY FOOTPRINT: KEY PLAYERS, 2025
      • 15.7.5.1 Company footprint
      • 15.7.5.2 Region footprint
      • 15.7.5.3 End user footprint
      • 15.7.5.4 Component footprint
  • 15.8 COMPANY EVALUATION MATRIX: STARTUPS/SMES, 2025
    • 15.8.1 PROGRESSIVE COMPANIES
    • 15.8.2 RESPONSIVE COMPANIES
    • 15.8.3 DYNAMIC COMPANIES
    • 15.8.4 STARTING BLOCKS
    • 15.8.5 COMPETITIVE BENCHMARKING: STARTUPS/SMES, 2025
      • 15.8.5.1 Detailed list of key startups/SMEs
      • 15.8.5.2 Competitive benchmarking of key startups/SMEs
  • 15.9 COMPETITIVE SCENARIO
    • 15.9.1 PRODUCT LAUNCHES
    • 15.9.2 DEALS

16 COMPANY PROFILES

  • 16.1 INTRODUCTION
  • 16.2 KEY SYSTEM MANUFACTURERS
    • 16.2.1 ASML
      • 16.2.1.1 Business overview
      • 16.2.1.2 Products/Solutions/Services offered
      • 16.2.1.3 Recent developments
        • 16.2.1.3.1 Deals
      • 16.2.1.4 MnM view
        • 16.2.1.4.1 Key strengths/Right to win
        • 16.2.1.4.2 Strategic choices
        • 16.2.1.4.3 Weaknesses/Competitive threats
  • 16.3 KEY COMPONENT MANUFACTURERS
    • 16.3.1 LIGHT SOURCE MANUFACTURERS
      • 16.3.1.1 TRUMPF
        • 16.3.1.1.1 Business overview
        • 16.3.1.1.2 Products/Solutions/Services offered
        • 16.3.1.1.3 MnM view
          • 16.3.1.1.3.1 Key strengths/Right to win
          • 16.3.1.1.3.2 Strategic choices
          • 16.3.1.1.3.3 Weaknesses/Competitive threats
      • 16.3.1.2 Ushio Inc.
        • 16.3.1.2.1 Business overview
        • 16.3.1.2.2 Products/Solutions/Services offered
        • 16.3.1.2.3 MnM view
          • 16.3.1.2.3.1 Key strengths/Right to win
          • 16.3.1.2.3.2 Strategic choices
          • 16.3.1.2.3.3 Weaknesses/Competitive threats
      • 16.3.1.3 Energetiq
        • 16.3.1.3.1 Business overview
        • 16.3.1.3.2 Products/Solutions/Services offered
        • 16.3.1.3.3 Recent developments
          • 16.3.1.3.3.1 Product launches
        • 16.3.1.3.4 MnM view
          • 16.3.1.3.4.1 Key strengths/Right to win
          • 16.3.1.3.4.2 Strategic choices
          • 16.3.1.3.4.3 Weaknesses/Competitive threats
    • 16.3.2 OPTICS MANUFACTURERS
      • 16.3.2.1 ZEISS Group
        • 16.3.2.1.1 Business overview
        • 16.3.2.1.2 Products/Solutions/Services offered
        • 16.3.2.1.3 Recent developments
          • 16.3.2.1.3.1 Product launches
          • 16.3.2.1.3.2 Deals
      • 16.3.2.2 NTT ADVANCED TECHNOLOGY CORPORATION
        • 16.3.2.2.1 Business overview
        • 16.3.2.2.2 Products/Solutions/Services offered
      • 16.3.2.3 Rigaku Holdings Corporation
        • 16.3.2.3.1 Business overview
        • 16.3.2.3.2 Products/Solutions/Services offered
      • 16.3.2.4 Edmund Optics Inc.
        • 16.3.2.4.1 Business overview
        • 16.3.2.4.2 Products/Solutions/Services offered
    • 16.3.3 MASK MANUFACTURERS
      • 16.3.3.1 AGC Inc.
        • 16.3.3.1.1 Business overview
        • 16.3.3.1.2 Products/Solutions/Services offered
      • 16.3.3.2 Tekscend Photomask
        • 16.3.3.2.1 Business overview
        • 16.3.3.2.2 Products/Solutions/Services offered
      • 16.3.3.3 Lasertec Corporation
        • 16.3.3.3.1 Business overview
        • 16.3.3.3.2 Products/Solutions/Services offered
        • 16.3.3.3.3 Recent developments
          • 16.3.3.3.3.1 Product launches
      • 16.3.3.4 HOYA Corporation
        • 16.3.3.4.1 Business overview
        • 16.3.3.4.2 Products/Solutions/Services offered
      • 16.3.3.5 NuFlare Technology Inc.
        • 16.3.3.5.1 Business overview
        • 16.3.3.5.2 Products/Solutions/Services offered
    • 16.3.4 OTHER COMPONENT MANUFACTURERS
      • 16.3.4.1 KLA Corporation
      • 16.3.4.2 ADVANTEST CORPORATION
      • 16.3.4.3 SUSS MicroTec SE
      • 16.3.4.4 Applied Materials, Inc.
      • 16.3.4.5 Park Systems
      • 16.3.4.6 Imagine Optic
      • 16.3.4.7 MKS Inc.
  • 16.4 END USERS
    • 16.4.1 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
    • 16.4.2 INTEL CORPORATION
    • 16.4.3 SAMSUNG
    • 16.4.4 SK HYNIX INC.
    • 16.4.5 MICRON TECHNOLOGY, INC.

17 RESEARCH METHODOLOGY

  • 17.1 RESEARCH DATA
  • 17.2 SECONDARY AND PRIMARY RESEARCH
    • 17.2.1 SECONDARY DATA
      • 17.2.1.1 List of key secondary sources
      • 17.2.1.2 Key data from secondary sources
    • 17.2.2 PRIMARY DATA
      • 17.2.2.1 List of primary interview participants
      • 17.2.2.2 Breakdown of primaries
      • 17.2.2.3 Key data from primary sources
      • 17.2.2.4 Key industry insights
  • 17.3 MARKET SIZE ESTIMATION
    • 17.3.1 BOTTOM-UP APPROACH
      • 17.3.1.1 Approach to arrive at market size using bottom-up analysis (demand side)
    • 17.3.2 TOP-DOWN APPROACH
      • 17.3.2.1 Approach to arrive at market size using top-down analysis (supply side)
  • 17.4 MARKET SIZE ESTIMATION FOR BASE YEAR
  • 17.5 MARKET FORECAST APPROACH
    • 17.5.1 SUPPLY SIDE
    • 17.5.2 DEMAND SIDE
  • 17.6 DATA TRIANGULATION
  • 17.7 RESEARCH ASSUMPTIONS
  • 17.8 RESEARCH LIMITATIONS
  • 17.9 RISK ANALYSIS

18 APPENDIX

  • 18.1 INSIGHTS FROM INDUSTRY EXPERTS
  • 18.2 DISCUSSION GUIDE
  • 18.3 KNOWLEDGESTORE: MARKETSANDMARKETS' SUBSCRIPTION PORTAL
  • 18.4 CUSTOMIZATION OPTIONS
  • 18.5 RELATED REPORTS
  • 18.6 AUTHOR DETAILS

List of Tables

  • TABLE 1 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: INCLUSIONS AND EXCLUSIONS
  • TABLE 2 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: SUMMARY OF CHANGES
  • TABLE 3 PORTER'S FIVE FORCES ANALYSIS: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET
  • TABLE 4 GDP PERCENTAGE CHANGE, BY KEY COUNTRY, 2021-2029
  • TABLE 5 ROLE OF COMPANIES IN EUV LITHOGRAPHY ECOSYSTEM
  • TABLE 6 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM TYPES OFFERED BY ASML, 2021-2025 (USD)
  • TABLE 7 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM, BY REGION, 2021-2025 (USD MILLION)
  • TABLE 8 IMPORT DATA FOR HS CODE 8442-COMPLIANT PRODUCTS, BY COUNTRY, 2020-2024 (USD MILLION)
  • TABLE 9 EXPORT DATA FOR HS CODE 8442-COMPLIANT PRODUCTS, BY COUNTRY, 2020-2024 (USD MILLION)
  • TABLE 10 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: KEY CONFERENCES AND EVENTS, 2026-2027
  • TABLE 11 US-ADJUSTED RECIPROCAL TARIFF RATES
  • TABLE 12 LIST OF MAJOR PATENTS, 2023-2024
  • TABLE 13 TOP USE CASES AND MARKET POTENTIAL
  • TABLE 14 BEST PRACTICES FOLLOWED BY COMPANIES
  • TABLE 15 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: CASE STUDIES RELATED TO AI IMPLEMENTATION
  • TABLE 16 INTERCONNECTED/ADJACENT ECOSYSTEM AND IMPACT ON MARKET PLAYERS
  • TABLE 17 AMERICAS: REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
  • TABLE 18 EUROPE: REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
  • TABLE 19 ASIA PACIFIC: REGULATORY BODIES, GOVERNMENT AGENCIES, AND OTHER ORGANIZATIONS
  • TABLE 20 EUV LITHOGRAPHY: REGULATIONS
  • TABLE 21 INFLUENCE OF STAKEHOLDERS ON BUYING PROCESS FOR END USERS (%)
  • TABLE 22 KEY BUYING CRITERIA FOR END USERS
  • TABLE 23 UNMET NEEDS OF END USERS OF EUV LITHOGRAPHY TECHNOLOGY
  • TABLE 24 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY COMPONENT, 2022-2025 (USD MILLION)
  • TABLE 25 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY COMPONENT, 2026-2032 (USD MILLION)
  • TABLE 26 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY SYSTEM TYPE, IN TERMS OF VALUE AND VOLUME, 2022-2025
  • TABLE 27 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY SYSTEM TYPE, IN TERMS OF VALUE AND VOLUME, 2026-2032
  • TABLE 28 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY SYSTEM TYPE, 2022-2025 (USD MILLION)
  • TABLE 29 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY SYSTEM TYPE, 2026-2032 (USD MILLION)
  • TABLE 30 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022-2025 (USD MILLION)
  • TABLE 31 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026-2032 (USD MILLION)
  • TABLE 32 INTEGRATED DEVICE MANUFACTURERS (IDMS): EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION, 2022-2025 (USD MILLION)
  • TABLE 33 INTEGRATED DEVICE MANUFACTURERS (IDMS): EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION, 2026-2032 (USD MILLION)
  • TABLE 34 INTEGRATED DEVICE MANUFACTURERS (IDMS): EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2022-2025 (USD MILLION)
  • TABLE 35 INTEGRATED DEVICE MANUFACTURERS (IDMS): EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2026-2032 (USD MILLION)
  • TABLE 36 FOUNDRIES: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION, 2022-2025 (USD MILLION)
  • TABLE 37 FOUNDRIES: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION, 2026-2032 (USD MILLION)
  • TABLE 38 FOUNDRIES: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2022-2025 (USD MILLION)
  • TABLE 39 FOUNDRIES: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN ASIA PACIFIC, BY COUNTRY, 2026-2032 (USD MILLION)
  • TABLE 40 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY APPLICATION, 2022-2025 (USD MILLION)
  • TABLE 41 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY APPLICATION, 2026-2032 (USD MILLION)
  • TABLE 42 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION, 2022-2025 (USD MILLION)
  • TABLE 43 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY REGION, 2026-2032 (USD MILLION)
  • TABLE 44 AMERICAS: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022-2025 (USD MILLION)
  • TABLE 45 AMERICAS: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026-2032 (USD MILLION)
  • TABLE 46 EMEA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022-2025 (USD MILLION)
  • TABLE 47 EMEA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026-2032 (USD MILLION)
  • TABLE 48 ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY COUNTRY, 2022-2025 (USD MILLION)
  • TABLE 49 ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY COUNTRY, 2026-2032 (USD MILLION)
  • TABLE 50 ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022-2025 (USD MILLION)
  • TABLE 51 ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026-2032 (USD MILLION)
  • TABLE 52 CHINA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022-2025 (USD MILLION)
  • TABLE 53 CHINA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026-2032 (USD MILLION)
  • TABLE 54 JAPAN: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022-2025 (USD MILLION)
  • TABLE 55 JAPAN: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026-2032 (USD MILLION)
  • TABLE 56 SOUTH KOREA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022-2025 (USD MILLION)
  • TABLE 57 SOUTH KOREA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026-2032 (USD MILLION)
  • TABLE 58 TAIWAN: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022-2025 (USD MILLION)
  • TABLE 59 TAIWAN: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026-2032 (USD MILLION)
  • TABLE 60 REST OF ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2022-2025 (USD MILLION)
  • TABLE 61 REST OF ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, BY END USER, 2026-2032 (USD MILLION)
  • TABLE 62 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: KEY PLAYER STRATEGIES/ RIGHT TO WIN, 2024-2025
  • TABLE 63 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: DEGREE OF COMPETITION
  • TABLE 64 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: REGION FOOTPRINT, 2025
  • TABLE 65 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: END USER FOOTPRINT, 2025
  • TABLE 66 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: COMPONENT FOOTPRINT, 2025
  • TABLE 67 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: LIST OF KEY STARTUPS/SMES, 2025
  • TABLE 68 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: COMPETITIVE BENCHMARKING OF KEY STARTUPS/SMES, 2025
  • TABLE 69 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: PRODUCT LAUNCHES, OCTOBER 2024 TO DECEMBER 2025
  • TABLE 70 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: DEALS, OCTOBER 2024 TO DECEMBER 2025
  • TABLE 71 ASML: COMPANY OVERVIEW
  • TABLE 72 ASML: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 73 ASML: DEALS
  • TABLE 74 TRUMPF: COMPANY OVERVIEW
  • TABLE 75 TRUMPF: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 76 USHIO INC.: COMPANY OVERVIEW
  • TABLE 77 USHIO INC.: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 78 ENERGETIQ: COMPANY OVERVIEW
  • TABLE 79 ENERGETIQ: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 80 ENERGETIQ: PRODUCT LAUNCHES
  • TABLE 81 ZEISS GROUP: COMPANY OVERVIEW
  • TABLE 82 ZEISS GROUP: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 83 ZEISS GROUP: PRODUCT LAUNCHES
  • TABLE 84 ZEISS GROUP: DEALS
  • TABLE 85 NTT ADVANCED TECHNOLOGY CORPORATION: COMPANY OVERVIEW
  • TABLE 86 NTT ADVANCED TECHNOLOGY CORPORATION: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 87 RIGAKU HOLDINGS CORPORATION: COMPANY OVERVIEW
  • TABLE 88 RIGAKU HOLDINGS CORPORATION: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 89 EDMUND OPTICS INC.: COMPANY OVERVIEW
  • TABLE 90 EDMUND OPTICS INC.: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 91 AGC INC.: COMPANY OVERVIEW
  • TABLE 92 AGC INC.: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 93 TEKSCEND PHOTOMASK: COMPANY OVERVIEW
  • TABLE 94 TEKSCEND PHOTOMASK: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 95 LASERTEC CORPORATION: COMPANY OVERVIEW
  • TABLE 96 LASERTEC CORPORATION: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 97 LASERTEC CORPORATION: PRODUCT LAUNCHES
  • TABLE 98 HOYA CORPORATION: COMPANY OVERVIEW
  • TABLE 99 HOYA CORPORATION: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 100 NUFLARE TECHNOLOGY INC.: COMPANY OVERVIEW
  • TABLE 101 NUFLARE TECHNOLOGY INC.: PRODUCTS/SOLUTIONS/SERVICES OFFERED
  • TABLE 102 KLA CORPORATION: COMPANY OVERVIEW
  • TABLE 103 ADVANTEST CORPORATION: COMPANY OVERVIEW
  • TABLE 104 SUSS MICROTEC SE: COMPANY OVERVIEW
  • TABLE 105 APPLIED MATERIALS, INC.: COMPANY OVERVIEW
  • TABLE 106 PARK SYSTEMS: COMPANY OVERVIEW
  • TABLE 107 IMAGINE OPTIC: COMPANY OVERVIEW
  • TABLE 108 MKS INC.: COMPANY OVERVIEW
  • TABLE 109 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED: COMPANY OVERVIEW
  • TABLE 110 INTEL CORPORATION: COMPANY OVERVIEW
  • TABLE 111 SAMSUNG: COMPANY OVERVIEW
  • TABLE 112 SK HYNIX INC.: COMPANY OVERVIEW
  • TABLE 113 MICRON TECHNOLOGY, INC.: COMPANY OVERVIEW
  • TABLE 114 MAJOR SECONDARY SOURCES
  • TABLE 115 PRIMARY INTERVIEW PARTICIPANTS
  • TABLE 116 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: RISK ANALYSIS

List of Figures

  • FIGURE 1 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SEGMENTATION AND REGIONAL SCOPE
  • FIGURE 2 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: DURATION COVERED
  • FIGURE 3 MARKET SCENARIO
  • FIGURE 4 GLOBAL EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SIZE, 2022-2032
  • FIGURE 5 MAJOR STRATEGIES ADOPTED BY KEY PLAYERS IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, 2024-2025
  • FIGURE 6 DISRUPTIVE TRENDS IMPACTING GROWTH OF EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET
  • FIGURE 7 HIGH-GROWTH SEGMENTS IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET, 2026-2032
  • FIGURE 8 ASIA PACIFIC TO DOMINATE EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN 2026
  • FIGURE 9 RISING DEMAND FOR ADVANCED SEMICONDUCTOR NOTES TO CREATE OPPORTUNITIES FOR MARKET PLAYERS
  • FIGURE 10 FOUNDRIES TO COMMAND EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN 2032
  • FIGURE 11 LOGIC CHIPS SEGMENT TO DOMINATE EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN 2032
  • FIGURE 12 ASIA PACIFIC TO CAPTURE LARGEST SHARE OF EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET IN 2032
  • FIGURE 13 DRIVERS, RESTRAINTS, OPPORTUNITIES, AND CHALLENGES
  • FIGURE 14 IMPACT ANALYSIS: DRIVERS
  • FIGURE 15 IMPACT ANALYSIS: RESTRAINTS
  • FIGURE 16 IMPACT ANALYSIS: OPPORTUNITIES
  • FIGURE 17 IMPACT ANALYSIS: CHALLENGES
  • FIGURE 18 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: PORTER'S FIVE FORCES ANALYSIS
  • FIGURE 19 EUV LITHOGRAPHY VALUE CHAIN ANALYSIS
  • FIGURE 20 EUV LITHOGRAPHY ECOSYSTEM ANALYSIS
  • FIGURE 21 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM TYPES OFFERED BY KEY PLAYERS, 2021-2025
  • FIGURE 22 AVERAGE SELLING PRICE TREND OF EUV LITHOGRAPHY SYSTEM, BY REGION, 2021-2025
  • FIGURE 23 IMPORT SCENARIO FOR HS CODE 8442-COMPLIANT PRODUCTS IN TOP 5 COUNTRIES, 2020-2024
  • FIGURE 24 EXPORT SCENARIO FOR HS CODE 8442-COMPLIANT PRODUCTS IN TOP 5 COUNTRIES, 2020-2024
  • FIGURE 25 TRENDS/DISRUPTIONS IMPACTING CUSTOMER BUSINESS
  • FIGURE 26 INVESTMENT AND FUNDING SCENARIO, 2020-2025
  • FIGURE 27 PATENTS APPLIED AND GRANTED, 2015-2024
  • FIGURE 28 DECISION-MAKING FACTORS IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET
  • FIGURE 29 INFLUENCE OF STAKEHOLDERS ON BUYING PROCESS FOR END USERS
  • FIGURE 30 KEY BUYING CRITERIA FOR END USERS
  • FIGURE 31 ADOPTION BARRIERS AND INTERNAL CHALLENGES
  • FIGURE 32 LIGHT SOURCES TO REGISTER HIGHEST CAGR DURING FORECAST PERIOD
  • FIGURE 33 0.55 NA EUV SYSTEMS (EXE) TO EXHIBIT HIGHER CAGR DURING FORECAST PERIOD
  • FIGURE 34 FOUNDRIES TO ACCOUNT FOR LARGER MARKET SHARE IN 2026
  • FIGURE 35 MEMORY CHIPS TO REGISTER HIGHER CAGR DURING FORECAST PERIOD
  • FIGURE 36 ASIA PACIFIC TO DOMINATE EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET THROUGHOUT FORECAST PERIOD
  • FIGURE 37 AMERICAS: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SNAPSHOT
  • FIGURE 38 EMEA: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SNAPSHOT
  • FIGURE 39 ASIA PACIFIC: EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SNAPSHOT
  • FIGURE 40 REVENUE ANALYSIS OF KEY PLAYERS, 2021-2025
  • FIGURE 41 MARKET SHARE ANALYSIS OF COMPANIES OFFERING EUV LITHOGRAPHY SOLUTIONS, 2025
  • FIGURE 42 COMPANY VALUATION, 2025
  • FIGURE 43 FINANCIAL METRICS, 2025
  • FIGURE 44 PRODUCT COMPARISON
  • FIGURE 45 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: COMPANY EVALUATION MATRIX (KEY PLAYERS), 2025
  • FIGURE 46 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: COMPANY FOOTPRINT, 2025
  • FIGURE 47 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: COMPANY EVALUATION MATRIX (STARTUPS/SMES), 2025
  • FIGURE 48 ASML: COMPANY SNAPSHOT
  • FIGURE 49 TRUMPF: COMPANY SNAPSHOT
  • FIGURE 50 USHIO INC.: COMPANY SNAPSHOT
  • FIGURE 51 ZEISS GROUP: COMPANY SNAPSHOT
  • FIGURE 52 RIGAKU HOLDINGS CORPORATION: COMPANY SNAPSHOT
  • FIGURE 53 AGC INC.: COMPANY SNAPSHOT
  • FIGURE 54 TEKSCEND PHOTOMASK: COMPANY SNAPSHOT
  • FIGURE 55 LASERTEC CORPORATION: COMPANY SNAPSHOT
  • FIGURE 56 HOYA CORPORATION: COMPANY SNAPSHOT
  • FIGURE 57 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: RESEARCH DESIGN
  • FIGURE 58 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: RESEARCH APPROACH
  • FIGURE 59 DATA CAPTURED FROM SECONDARY SOURCES
  • FIGURE 60 BREAKDOWN OF PRIMARY INTERVIEWS, BY COMPANY TYPE, DESIGNATION, AND REGION
  • FIGURE 61 DATA CAPTURED FROM PRIMARY SOURCES
  • FIGURE 62 CORE FINDINGS FROM INDUSTRY EXPERTS
  • FIGURE 63 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: RESEARCH FLOW
  • FIGURE 64 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: BOTTOM-UP APPROACH
  • FIGURE 65 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: TOP-DOWN APPROACH
  • FIGURE 66 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET SIZE ESTIMATION METHODOLOGY (SUPPLY SIDE)
  • FIGURE 67 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: DATA TRIANGULATION
  • FIGURE 68 EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY MARKET: RESEARCH ASSUMPTIONS