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半導體生產設備半導體製造設備

市場調查報告書

商品編碼

2111183

EUV微影市場預測至2034年－按設備類型、解析度節點、應用、最終用戶和地區分類的全球分析

EUV Lithography Market Forecasts to 2034 - Global Analysis By Equipment Type, Resolution Node, Application, End User, and By Geography

出版日期: 2026年08月01日 | 出版商:

Stratistics Market Research Consulting | 英文 200+ Pages | 商品交期: 2-3個工作天內

價格

簡介目錄圖表

根據 Stratistics MRC 的數據，預計到 2026 年，全球 EUV 光刻市場規模將達到 143 億美元，並在預測期內以 12.3% 的複合年成長率成長，到 2034 年將達到 363 億美元。

極紫外線（EUV）光刻技術是一種尖端的半導體製造技術，它利用波長為13.5奈米的超紫外線來形成具有奈米級微結構的積體電路。該技術能夠以7奈米、5奈米、3奈米、2奈米以及2奈米以下的先進解析度節點製造晶片，從而支援包括邏輯裝置、儲存裝置、代工製造、先進封裝以及研發在內的廣泛應用。 EUV光刻技術對於基於莫耳定律的持續小型化至關重要，它能夠提高半導體的電晶體密度、性能並降低功耗。人工智慧、高效能運算、智慧型手機和資料中心對先進晶片的需求不斷成長，加上半導體日益複雜，是推動各地區市場擴張的主要動力。

人工智慧、高效能運算和家用電子電器。

人工智慧、高效能運算和先進家用電子電器對高效能半導體的需求呈指數級成長，這是推動極紫外光微影（EUV）市場發展的主要動力。人工智慧加速器、GPU、CPU 和行動處理器需要極小的幾何尺寸和極高的電晶體密度，而這正是 EUV 微影技術所能實現的。隨著晶片設計日益複雜，先進的製程節點需要採用多重圖形化EUV 技術。隨著人工智慧工作負載的增加和運算需求的日益複雜，半導體製造商正大力投資擴大 EUV 產能。對更精細製程節點的競爭持續推動 EUV 技術的應用，並推動市場持續成長。

設備成本高且操作複雜

EUV微影術系統所需的巨額資本投入以及EUV生產線營運管理的複雜性是限制市場發展的主要因素。每台EUV掃描儀的成本高達數億美元，且相關設施和基礎設施的要求也很高。 EUV系統的運作需要電力消耗並進行維護。在先進製程節點上實現穩定的良率需要大量的製程開發。只有規模最大的半導體製造商才能負擔得起對EUV技術的投資。這些成本和複雜性方面的障礙可能會限制市場參與企業，減緩產能擴張，進而影響整體市場成長。

下一代極紫外光微影技術的發展

EUV光源、光學元件和光阻劑材料的持續創新為EUV微影術市場帶來了巨大的機會。高功率EUV光源可提高生產效率及產能。先進的光學元件可提升解析度和套刻精度。新型光阻劑材料透過提高靈敏度和線邊緣粗糙度，實現了更精細的圖形化。高數值孔徑（高NA）EUV技術將解析度擴展到2nm以下的節點。新型光阻劑的開發支援先進節點圖形化並提高製造效率。隨著EUV技術的不斷進步，下一代EUV解決方案正在擴大市場佔有率，推動半導體的持續小型化，並拓展其目標市場。

地緣政治緊張局勢與技術出口限制

地緣政治緊張局勢加劇和技術出口限制對極微影術（EUV）市場構成重大威脅。由於EUV技術在半導體製造中具有戰略重要性，因此受到嚴格的出口管制。對某些國家銷售EUV設備的限制縮小了目標市場，並限制了產能擴張。供應鏈對專用元件的依賴也造成了脆弱性。技術脫鉤可能導致並行發展，而這種發展無法完全彌補市場機會的損失。這些地緣政治壓力造成了不確定性，並可能減緩全球EUV市場的成長。

新型冠狀病毒（COVID-19）的影響：

新冠疫情對極紫外光刻（EUV）市場產生了重大影響。初期衝擊包括供應鏈中斷、生產放緩和投資減少。然而，疫情也加速了對支援遠距辦公、雲端運算和數位服務的半導體的需求。半導體短缺凸顯了先進製造能力的戰略重要性，並加速了對EUV設備的投資。資料中心和人工智慧基礎設施的需求持續成長。疫情過後，半導體製造商增加了資本投資，EUV設備在產能擴張計畫中發揮了核心作用。此次危機再次印證了EUV技術在經濟競爭力和國家安全方面的戰略重要性。

在預測期內，7nm 製程預計將佔據最大的市場佔有率。

預計在預測期內，7nm製程將佔據最大的市場佔有率，這主要得益於7nm技術在多種應用領域的廣泛採用，以及支撐該節點的成熟製造基礎設施。 7nm節點是首個採用EUV微影技術進行量產的節點，並具備廣泛的部署能力。此製程的優點在於其適用範圍廣泛，涵蓋邏輯、記憶體和代工等領域。成熟的製程開發和良率提升為穩定的生產提供了保障。隨著半導體製造商不斷擴大7nm及其衍生節點的產能，此製程在最高解析度節點中仍保持最大的市場佔有率。

預計在預測期內，先進包裝產業將呈現最高的複合年成長率。

在預測期內，先進封裝領域預計將呈現最高的成長率，這主要得益於先進封裝技術（例如3D整合、晶片組和異構整合）的日益普及，而這些技術都需要極微影術（EUV）來實現精細間距圖形化。先進封裝能夠超越傳統節點微縮，持續提升性能，而EUV微影技術則能夠實現更精細的互連和更高的整合密度。該領域正受益於晶片組架構和系統級封裝（SiP）解決方案的日益普及。晶圓代工廠和OSAT供應商正在投資建造用於先進封裝的EUV光刻能力。隨著先進封裝成為半導體性能的關鍵所在，該應用將成為該領域成長最快的驅動力。

市佔率最大的地區：

在預測期內，亞太地區預計將佔據最大的市場佔有率，這主要得益於該地區半導體製造的集中、EUV設備的廣泛應用以及眾多大型晶圓代工廠和記憶體製造商的存在。台灣、韓國和日本位置一些全球最先進的半導體生產設施，並廣泛部署了EUV設備。該地區佔據了全球半導體製造和EUV設備採購的大部分佔有率。政府對國內半導體生產的支持正在加速EUV產能的擴張。憑藉集中的製造地和持續的技術投資，亞太地區保持其市場主導地位。

複合年成長率最高的地區：

在預測期內，亞太地區預計將呈現最高的複合年成長率，這主要得益於產能的持續擴張、技術升級以及中國、韓國、日本和台灣地區對先進半導體製造領域投資的增加。隨著新製造設施和技術節點的不斷湧現，該地區的半導體產業持續擴張。政府鼓勵國內半導體生產的政策正在加速對極紫外光刻（EUV）技術的投資。國內需求的成長和出口市場的成長正在推動產能擴張。隨著半導體生產規模的擴大和技術的進步，亞太地區正經歷全球成長最快的極紫外光刻市場。

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所有購買此報告的客戶均可享受以下免費自訂選項之一：

企業概況
- 對其他市場參與者（最多 3 家公司）進行全面分析
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區域細分
- 根據客戶要求，我們可以提供主要國家的市場估算和預測，以及複合年成長率（註：需經可行性確認）。
競爭性標竿分析
- 根據產品系列、地理覆蓋範圍和策略聯盟對領先公司進行基準分析。

北美洲
- 美國
- 加拿大
- 墨西哥
歐洲
- 英國
- 德國
- 法國
- 義大利
- 西班牙
- 荷蘭
- 比利時
- 瑞典
- 瑞士
- 波蘭
- 其他歐洲國家
亞太地區
- 中國
- 日本
- 印度
- 韓國
- 澳洲
- 印尼
- 泰國
- 馬來西亞
- 新加坡
- 越南
- 其他亞太國家
南美洲
- 巴西
- 阿根廷
- 哥倫比亞
- 智利
- 秘魯
- 其他南美國家
世界其他地區（RoW）
- 中東
  - 沙烏地阿拉伯
  - 阿拉伯聯合大公國
  - 卡達
  - 以色列
  - 其他中東國家
- 非洲
  - 南非
  - 埃及
  - 摩洛哥
  - 其他非洲國家

第10章戰略市場資訊

工業價值網路和供應鏈評估
空白區域和機會地圖
產品演進與市場生命週期分析
通路、經銷商和打入市場策略的評估

第11章產業趨勢與策略舉措

併購
夥伴關係、聯盟和合資企業
新產品發布和認證
擴大生產能力和投資
其他策略舉措

第12章：公司簡介

ASML Holding NV
Carl Zeiss SMT GmbH
Cymer LLC
TRUMPF Group
Ushio Inc.
KLA Corporation
Lam Research Corporation
Applied Materials, Inc.
Tokyo Electron Limited
Canon Inc.
Nikon Corporation
Intel Corporation
Taiwan Semiconductor Manufacturing Company（TSMC）
Samsung Electronics Co., Ltd.
SK hynix Inc.

簡介目錄圖表

Product Code: SMRC38914

According to Stratistics MRC, the Global EUV Lithography Market is accounted for $14.3 billion in 2026 and is expected to reach $36.3 billion by 2034 growing at a CAGR of 12.3% during the forecast period. Extreme Ultraviolet (EUV) lithography is an advanced semiconductor manufacturing technology that uses extreme ultraviolet light at 13.5 nm wavelength to pattern integrated circuits with nanometer-scale features. This technology enables the production of chips at advanced resolution nodes including 7 nm, 5 nm, 3 nm, 2 nm, and below 2 nm, supporting applications across logic devices, memory devices, foundry manufacturing, advanced packaging, and research and development. EUV lithography is essential for continued Moore's Law scaling, enabling higher transistor density, improved performance, and reduced power consumption in semiconductors. Growing demand for advanced chips in artificial intelligence, high-performance computing, smartphones, and data centers, combined with increasing semiconductor complexity, are key drivers of market expansion across all regions.

Market Dynamics:

Driver:

Growing demand for advanced chips in AI, HPC, and consumer electronics

The exponential growth in demand for high-performance semiconductors in artificial intelligence, high-performance computing, and advanced consumer electronics is a primary driver for the EUV lithography market. AI accelerators, GPU, CPU, and mobile processors require the smallest geometries and highest transistor densities achievable through EUV lithography. The increasing complexity of chip designs demands multi-patterning EUV approaches for advanced nodes. As AI workloads intensify and computing requirements escalate, semiconductor manufacturers are investing heavily in EUV capacity expansion. The race toward smaller nodes continues to push EUV adoption, driving sustained market growth.

Restraint:

High equipment costs and operational complexity

The significant capital investment required for EUV lithography systems and the operational complexity of managing EUV production lines represent a major restraint for the market. EUV scanners cost hundreds of millions of dollars each, with substantial facility and infrastructure requirements. Operating EUV systems requires significant power consumption and maintenance. Achieving stable production yields at advanced nodes demands extensive process development. Only the largest semiconductor manufacturers can justify investment in EUV technology. These cost and complexity barriers limit market participation and may slow capacity expansion, affecting overall market growth.

Opportunity:

Development of next-generation EUV technologies

Continuous innovation in EUV light sources, optics, and photoresist materials presents significant opportunities for the EUV lithography market. Higher power EUV sources enable increased throughput and productivity. Advanced optics improve resolution and overlay accuracy. Novel photoresist materials enable finer patterning with improved sensitivity and line-edge roughness. High-NA EUV technology extends resolution to sub-2nm nodes. Development of new photoresists supports patterning advanced nodes and improves manufacturing efficiency. As EUV technology continues advancing, next-generation EUV solutions capture growing market share, enabling continued semiconductor scaling and expanding the addressable market.

Threat:

Geopolitical tensions and technology export restrictions

Escalating geopolitical tensions and technology export restrictions pose significant threats to the EUV lithography market. EUV technology is subject to strict export controls due to its strategic importance in semiconductor manufacturing. Restrictions on EUV equipment sales to certain countries reduce addressable markets and limit capacity expansion. Supply chain dependencies on specialized components create vulnerability. Technology decoupling may lead to parallel development efforts that do not fully compensate for lost market opportunities. These geopolitical pressures create uncertainty and may slow global EUV market growth.

Covid-19 Impact:

The COVID-19 pandemic had a significant impact on the EUV lithography market. Initial disruptions included supply chain interruptions, manufacturing slowdowns, and reduced investment. However, the pandemic accelerated demand for semiconductors powering remote work, cloud computing, and digital services. Semiconductor shortages highlighted the strategic importance of advanced manufacturing capacity, accelerating investment in EUV tools. Data center and AI infrastructure demand continued growing. Post-pandemic, semiconductor manufacturers have increased capital expenditure, with EUV tools central to capacity expansion plans. The crisis reinforced the strategic importance of EUV technology for economic competitiveness and national security.

The 7 nm segment is expected to be the largest during the forecast period

The 7 nm segment is expected to account for the largest market share during the forecast period, driven by the widespread adoption of 7 nm technology across multiple applications and the established manufacturing infrastructure supporting this node. The 7 nm node represents the first node where EUV was adopted for high-volume manufacturing, with extensive installed capacity. The segment benefits from broad applicability across logic, memory, and foundry applications. Established process development and yield improvement support consistent production. As semiconductor manufacturers expand capacity for 7 nm and derivative nodes, this segment maintains the largest resolution node share.

The Advanced Packaging segment is expected to have the highest CAGR during the forecast period

Over the forecast period, the Advanced Packaging segment is predicted to witness the highest growth rate, fueled by the growing adoption of advanced packaging technologies including 3D integration, chiplets, and heterogeneous integration that require EUV lithography for fine-pitch patterning. Advanced packaging enables continued performance scaling beyond traditional node scaling, with EUV enabling finer interconnects and higher-density integration. The segment benefits from growing adoption of chiplet architectures and system-in-package solutions. Foundries and OSAT providers are investing in EUV capabilities for advanced packaging. As advanced packaging becomes central to semiconductor performance, this application delivers the fastest segment growth.

Region with largest share:

During the forecast period, the Asia-Pacific region is expected to hold the largest market share, supported by concentrated semiconductor manufacturing, extensive EUV tool deployment, and the presence of leading foundries and memory manufacturers. Taiwan, South Korea, and Japan host the world's most advanced semiconductor production facilities with extensive EUV deployment. The region accounts for the majority of global semiconductor manufacturing and EUV tool purchases. Government support for domestic semiconductor production is accelerating EUV capacity expansion. With concentrated manufacturing and continuous technology investment, Asia Pacific maintains its dominant market position.

Region with highest CAGR:

Over the forecast period, the Asia-Pacific region is anticipated to exhibit the highest CAGR, driven by continued capacity expansion, technology upgrades, and increasing investment in advanced semiconductor manufacturing across China, South Korea, Japan, and Taiwan. The region's semiconductor industry continues expanding with new fabrication facilities and technology nodes. Government programs promoting domestic chip production are accelerating EUV investment. Growing domestic demand and export markets drive capacity expansion. As semiconductor production scales and technology advances, Asia Pacific delivers the fastest EUV lithography market growth globally.

Key players in the market

Some of the key players in EUV Lithography Market include ASML Holding N.V., Carl Zeiss SMT GmbH, Cymer LLC, TRUMPF Group, Ushio Inc., KLA Corporation, Lam Research Corporation, Applied Materials, Inc., Tokyo Electron Limited, Canon Inc., Nikon Corporation, Intel Corporation, Taiwan Semiconductor Manufacturing Company (TSMC), Samsung Electronics Co., Ltd., and SK hynix Inc.

Key Developments:

In July 2026, Intel initiated the deployment of ASML's High-NA EUV lithography systems to manufacture key layers of its flagship Panther Lake mobile processors.

In May 2026, ASML announced that the first commercial semiconductor products manufactured using its next-generation High-NA EUV lithography machines were expected to reach the market within months.

In April 2026, SK hynix outlined plans to install 20 Low-NA EUV scanners over a two-year period to scale up production of high-bandwidth memory (HBM3e and HBM4) for AI data center infrastructure.

In December 2025, TSMC completed the initial site installation and pilot calibration phases for its first research-and-development High-NA EUV tool received from ASML.

Equipment Types Covered:

EUV Exposure Systems (Scanners)
EUV Light Source Systems
EUV Optical Systems
EUV Mask Inspection Systems
EUV Metrology and Inspection Systems
Other Equipment

Resolution Nodes Covered:

7 nm
5 nm
3 nm
2 nm
Below 2 nm

Applications Covered:

Logic Devices
Memory Devices
Foundry Manufacturing
Advanced Packaging
Research and Development

End Users Covered:

Integrated Device Manufacturers (IDMs)
Pure-Play Foundries
Memory Manufacturers
Research Institutes and Universities

Regions Covered:

North America
- United States
- Canada
- Mexico
Europe
- United Kingdom
- Germany
- France
- Italy
- Spain
- Netherlands
- Belgium
- Sweden
- Switzerland
- Poland
- Rest of Europe
Asia Pacific
- China
- Japan
- India
- South Korea
- Australia
- Indonesia
- Thailand
- Malaysia
- Singapore
- Vietnam
- Rest of Asia Pacific
South America
- Brazil
- Argentina
- Colombia
- Chile
- Peru
- Rest of South America
Rest of the World (RoW)
- Middle East
Saudi Arabia
United Arab Emirates
Qatar
Israel
Rest of Middle East
- Africa
South Africa
Egypt
Morocco
Rest of Africa

What our report offers:

Market share assessments for the regional and country-level segments
Strategic recommendations for the new entrants
Covers Market data for the years 2023, 2024, 2025, 2026, 2027, 2028, 2030, 2032 and 2034
Market Trends (Drivers, Constraints, Opportunities, Threats, Challenges, Investment Opportunities, and recommendations)
Strategic recommendations in key business segments based on the market estimations
Competitive landscaping mapping the key common trends
Company profiling with detailed strategies, financials, and recent developments
Supply chain trends mapping the latest technological advancements

Free Customization Offerings:

All the customers of this report will be entitled to receive one of the following free customization options:

Company Profiling
- Comprehensive profiling of additional market players (up to 3)
- SWOT Analysis of key players (up to 3)
Regional Segmentation
- Market estimations, Forecasts and CAGR of any prominent country as per the client's interest (Note: Depends on feasibility check)
Competitive Benchmarking
- Benchmarking of key players based on product portfolio, geographical presence, and strategic alliances

1 Executive Summary

1.1 Market Snapshot and Key Highlights
1.2 Growth Drivers, Challenges, and Opportunities
1.3 Competitive Landscape Overview
1.4 Strategic Insights and Recommendations

2 Research Framework

2.1 Study Objectives and Scope
2.2 Stakeholder Analysis
2.3 Research Assumptions and Limitations
2.4 Research Methodology
- 2.4.1 Data Collection (Primary and Secondary)
- 2.4.2 Data Modeling and Estimation Techniques
- 2.4.3 Data Validation and Triangulation
- 2.4.4 Analytical and Forecasting Approach

3 Market Dynamics and Trend Analysis

3.1 Market Definition and Structure
3.2 Key Market Drivers
3.3 Market Restraints and Challenges
3.4 Growth Opportunities and Investment Hotspots
3.5 Industry Threats and Risk Assessment
3.6 Technology and Innovation Landscape
3.7 Emerging and High-Growth Markets
3.8 Regulatory and Policy Environment
3.9 Impact of COVID-19 and Recovery Outlook

4 Competitive and Strategic Assessment

4.1 Porter's Five Forces Analysis
- 4.1.1 Supplier Bargaining Power
- 4.1.2 Buyer Bargaining Power
- 4.1.3 Threat of Substitutes
- 4.1.4 Threat of New Entrants
- 4.1.5 Competitive Rivalry
4.2 Market Share Analysis of Key Players
4.3 Product Benchmarking and Performance Comparison

5 Global EUV Lithography Market, By Equipment Type

5.1 EUV Exposure Systems (Scanners)
5.2 EUV Light Source Systems
5.3 EUV Optical Systems
5.4 EUV Mask Inspection Systems
5.5 EUV Metrology and Inspection Systems
5.6 Other Equipment

6 Global EUV Lithography Market, By Resolution Node

6.1 7 nm
6.2 5 nm
6.3 3 nm
6.4 2 nm
6.5 Below 2 nm

7 Global EUV Lithography Market, By Application

7.1 Logic Devices
7.2 Memory Devices
- 7.2.1 DRAM
- 7.2.2 NAND Flash
7.3 Foundry Manufacturing
7.4 Advanced Packaging
7.5 Research and Development

8 Global EUV Lithography Market, By End User

8.1 Integrated Device Manufacturers (IDMs)
8.2 Pure-Play Foundries
8.3 Memory Manufacturers
8.4 Research Institutes and Universities

9 Global EUV Lithography Market, By Geography

9.1 North America
- 9.1.1 United States
- 9.1.2 Canada
- 9.1.3 Mexico
9.2 Europe
- 9.2.1 United Kingdom
- 9.2.2 Germany
- 9.2.3 France
- 9.2.4 Italy
- 9.2.5 Spain
- 9.2.6 Netherlands
- 9.2.7 Belgium
- 9.2.8 Sweden
- 9.2.9 Switzerland
- 9.2.10 Poland
- 9.2.11 Rest of Europe
9.3 Asia Pacific
- 9.3.1 China
- 9.3.2 Japan
- 9.3.3 India
- 9.3.4 South Korea
- 9.3.5 Australia
- 9.3.6 Indonesia
- 9.3.7 Thailand
- 9.3.8 Malaysia
- 9.3.9 Singapore
- 9.3.10 Vietnam
- 9.3.11 Rest of Asia Pacific
9.4 South America
- 9.4.1 Brazil
- 9.4.2 Argentina
- 9.4.3 Colombia
- 9.4.4 Chile
- 9.4.5 Peru
- 9.4.6 Rest of South America
9.5 Rest of the World (RoW)
- 9.5.1 Middle East
  - 9.5.1.1 Saudi Arabia
  - 9.5.1.2 United Arab Emirates
  - 9.5.1.3 Qatar
  - 9.5.1.4 Israel
  - 9.5.1.5 Rest of Middle East
- 9.5.2 Africa
  - 9.5.2.1 South Africa
  - 9.5.2.2 Egypt
  - 9.5.2.3 Morocco
  - 9.5.2.4 Rest of Africa

10 Strategic Market Intelligence

10.1 Industry Value Network and Supply Chain Assessment
10.2 White-Space and Opportunity Mapping
10.3 Product Evolution and Market Life Cycle Analysis
10.4 Channel, Distributor, and Go-to-Market Assessment

11 Industry Developments and Strategic Initiatives

11.1 Mergers and Acquisitions
11.2 Partnerships, Alliances, and Joint Ventures
11.3 New Product Launches and Certifications
11.4 Capacity Expansion and Investments
11.5 Other Strategic Initiatives

12 Company Profiles

12.1 ASML Holding N.V.
12.2 Carl Zeiss SMT GmbH
12.3 Cymer LLC
12.4 TRUMPF Group
12.5 Ushio Inc.
12.6 KLA Corporation
12.7 Lam Research Corporation
12.8 Applied Materials, Inc.
12.9 Tokyo Electron Limited
12.10 Canon Inc.
12.11 Nikon Corporation
12.12 Intel Corporation
12.13 Taiwan Semiconductor Manufacturing Company (TSMC)
12.14 Samsung Electronics Co., Ltd.
12.15 SK hynix Inc.

簡介目錄圖表

List of Tables

Table 1 Global EUV Lithography Market Outlook, By Region (2023-2034) ($MN)
Table 2 Global EUV Lithography Market Outlook, By Equipment Type (2023-2034) ($MN)
Table 3 Global EUV Lithography Market Outlook, By EUV Exposure Systems (Scanners) (2023-2034) ($MN)
Table 4 Global EUV Lithography Market Outlook, By EUV Light Source Systems (2023-2034) ($MN)
Table 5 Global EUV Lithography Market Outlook, By EUV Optical Systems (2023-2034) ($MN)
Table 6 Global EUV Lithography Market Outlook, By EUV Mask Inspection Systems (2023-2034) ($MN)
Table 7 Global EUV Lithography Market Outlook, By EUV Metrology and Inspection Systems (2023-2034) ($MN)
Table 8 Global EUV Lithography Market Outlook, By Other Equipment (2023-2034) ($MN)
Table 9 Global EUV Lithography Market Outlook, By Resolution Node (2023-2034) ($MN)
Table 10 Global EUV Lithography Market Outlook, By 7 nm (2023-2034) ($MN)
Table 11 Global EUV Lithography Market Outlook, By 5 nm (2023-2034) ($MN)
Table 12 Global EUV Lithography Market Outlook, By 3 nm (2023-2034) ($MN)
Table 13 Global EUV Lithography Market Outlook, By 2 nm (2023-2034) ($MN)
Table 14 Global EUV Lithography Market Outlook, By Below 2 nm (2023-2034) ($MN)
Table 15 Global EUV Lithography Market Outlook, By Application (2023-2034) ($MN)
Table 16 Global EUV Lithography Market Outlook, By Logic Devices (2023-2034) ($MN)
Table 17 Global EUV Lithography Market Outlook, By Memory Devices (2023-2034) ($MN)
Table 18 Global EUV Lithography Market Outlook, By DRAM (2023-2034) ($MN)
Table 19 Global EUV Lithography Market Outlook, By NAND Flash (2023-2034) ($MN)
Table 20 Global EUV Lithography Market Outlook, By Foundry Manufacturing (2023-2034) ($MN)
Table 21 Global EUV Lithography Market Outlook, By Advanced Packaging (2023-2034) ($MN)
Table 22 Global EUV Lithography Market Outlook, By Research and Development (2023-2034) ($MN)
Table 23 Global EUV Lithography Market Outlook, By End User (2023-2034) ($MN)
Table 24 Global EUV Lithography Market Outlook, By Integrated Device Manufacturers (IDMs) (2023-2034) ($MN)
Table 25 Global EUV Lithography Market Outlook, By Pure-Play Foundries (2023-2034) ($MN)
Table 26 Global EUV Lithography Market Outlook, By Memory Manufacturers (2023-2034) ($MN)
Table 27 Global EUV Lithography Market Outlook, By Research Institutes and Universities (2023-2034) ($MN)