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1734853

2032 年光掩模市場預測：按產品類型、掩模類型、技術節點、應用、最終用戶和地區進行的全球分析

Photomask Market Forecasts to 2032 - Global Analysis By Product Type (Reticle, Master Mask, Copy Mask, and Other Product Types), Mask Type, Technology Node, Application, End Users and By Geography
出版日期: | 出版商: Stratistics Market Research Consulting | 英文 200+ Pages | 商品交期: 2-3個工作天內

價格

根據 Stratistics MRC 的數據，全球光罩市場預計在 2025 年達到 58.1 億美元，到 2032 年將達到 91.6 億美元，預測期內的複合年成長率為 6.7%。

光掩模是微加工微影術的關鍵工具，尤其適用於半導體製造。它由一塊塗有不透明圖案的玻璃或石英板組成，圖案可以選擇性地阻擋光線。當暴露在紫外線 (UV) 下時，光掩模會將圖案轉移到矽晶片上的感光層上。這項製程可以精確蝕刻複雜的電路設計，而這些電路設計對於積體電路和其他微型元件的生產至關重要。

美國商務部報告顯示，2021年美國半導體銷售額成長了29%。

增加對半導體研發的投資

半導體技術研發的持續推進，推動了光掩模設計的創新，以提高其效率和耐用性。先進的光掩模能夠實現精確的電路圖形化，這是半導體製造的關鍵方面。極紫外線 (EUV)微影術的日益普及，進一步推動了對下一代光掩模的投資。領先的半導體製造商正在擴大研發預算，以增強光掩模的性能並降低製造成本。此外，研究機構與產業參與者之間的合作正在加速光掩模的進步。

製造成本高

開發光掩模需要先進的技術和專用設備，這需要大量的資本投入。隨著積體電路變得越來越複雜，需要更先進、規格更嚴格的光掩模，這進一步推高了成本。此外，製造過程中涉及昂貴的原料和複雜的製造程序，因此很難以合理的價格購買。高昂的營運成本阻礙了中小型製造商進入市場，限制了該行業的擴張。

微影術技術的進步

微影術技術的進步正在徹底改變光掩模產業，使半導體製造更加精確且有效率。向極紫外線（微影術的過渡顯著提高了光掩模的解析度和精度，從而提升了晶片性能。光學鄰近校正 (OPC) 和逆向微影術技術 (ILT) 等創新技術正在不斷改進設計流程。此外，計算微影術的整合正在簡化光掩模開發流程，加快半導體產品的上市時間。

熟練勞動力有限

光掩模產業需要具備半導體微影術和光學工程專業知識的高技能人才。然而，目前缺乏能夠跟上先進光掩模發展步伐的優秀工程師和技術人員。微影術技術的複雜性和不斷發展的行業標準使得持續的技能發展至關重要。企業在吸引和留住專業人才方面面臨挑戰，這影響了生產效率和創新。勞動力短缺可能會減緩下一代光掩模技術的採用，並影響市場成長。

COVID-19的影響

新冠疫情擾亂了全球半導體供應鏈，影響了光掩模的生產和分銷。封鎖和限制措施導致製造設施暫時關閉，導致半導體生產延遲。然而，在疫情後的復甦時期，半導體需求激增，刺激了對光掩模開發的投資。遠端辦公和電子設備使用率的提高進一步促進了半導體產量，使光掩模市場受益。

預計在預測期內，光罩部分將成為最大的部分。

預計在預測期內，光罩領域將佔據最大的市場佔有率，因為半導體裝置的持續微縮需要先進節點的高精度圖形化。 EUV微影術和3D IC封裝的採用進一步推動了對複雜光罩設計的需求。此外，人工智慧、5G和汽車電子領域的投資不斷增加，加速了先進晶片的生產，也推動了光掩模製造過程中對高品質光罩的需求。

預計電子業在預測期內將實現最高的複合年成長率。

預計在預測期內，電子產品領域將迎來最高成長，這得益於智慧型手機、筆記型電腦和物聯網設備等更小巧、更強大的設備需求的不斷成長。隨著消費者對更快、更小、更節能電子產品的需求不斷成長，半導體製造商需要先進的光掩模來實現精密晶片的生產。此外，顯示科技、穿戴式裝置和智慧家居設備的快速創新，持續推動著電子製造領域對高解析度光掩模解決方案的需求。

比最大的地區

在預測期內，亞太地區憑藉其在半導體製造業的主導地位，預計將佔據最大的市場佔有率。台灣、韓國、中國大陸和日本等國家和地區擁有台積電、三星和SK海力士等主要半導體工廠，這些工廠正在推動先進光掩模的需求。此外，政府的措施和對半導體基礎設施投資的增加也進一步推動了該地區市場的成長。

複合年成長率最高的地區：

新興技術，尤其是極紫外線 (EUV)微影術，需要高精度光掩模來滿足更小的製程節點和複雜的晶片設計。此外，家用電子電器、電動車和人工智慧應用的需求日益成長，進一步推動了對先進光掩模的需求，以滿足這些先進設備的需求。

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目錄

第1章執行摘要

第2章 前言

  • 概述
  • 相關利益者
  • 研究範圍
  • 調查方法
    • 資料探勘
    • 數據分析
    • 數據檢驗
    • 研究途徑
  • 研究材料
    • 主要研究資料
    • 次級研究資訊來源
    • 先決條件

第3章市場走勢分析

  • 驅動程式
  • 限制因素
  • 機會
  • 威脅
  • 技術分析
  • 應用分析
  • 最終用戶分析
  • 新興市場
  • COVID-19的影響

第4章 波特五力分析

  • 供應商的議價能力
  • 買家的議價能力
  • 替代品的威脅
  • 新進入者的威脅
  • 競爭對手之間的競爭

第5章全球光掩模市場（依產品類型）

  • 標線
  • 大師面具
  • 複製蒙版
  • 其他產品類型

第6章全球光掩模市場（以遮罩類型）

  • 二進制掩碼
  • 相移掩模版（PSM）
  • 極紫外線 (EUV) 光罩版
  • 其他類型的面膜

第7章 全球光掩模市場（依技術節點）

  • 傳統節點（28nm以上）
  • 10nm～14nm
  • 3nm～10nm

第8章全球光掩模市場（按應用）

  • 展示
  • 分立元件
  • 光學設備
  • MEMS
  • 半導體和積體電路
  • 平面顯示器
  • 其他用途

第9章全球光掩模市場（按最終用戶）

  • 電子產品
  • 車
  • 通訊
  • 航太和國防
  • 衛生保健
  • 其他最終用戶

第 10 章全球光掩模市場（按區域）

  • 北美洲
    • 美國
    • 加拿大
    • 墨西哥
  • 歐洲
    • 德國
    • 英國
    • 義大利
    • 法國
    • 西班牙
    • 其他歐洲國家
  • 亞太地區
    • 日本
    • 中國
    • 印度
    • 澳洲
    • 紐西蘭
    • 韓國
    • 其他亞太地區
  • 南美洲
    • 阿根廷
    • 巴西
    • 智利
    • 南美洲其他地區
  • 中東和非洲
    • 沙烏地阿拉伯
    • 阿拉伯聯合大公國
    • 卡達
    • 南非
    • 其他中東和非洲地區

第11章 重大進展

  • 協議、夥伴關係、合作和合資企業
  • 收購與合併
  • 新產品發布
  • 業務擴展
  • 其他關鍵策略

第12章 公司概況

  • Advance Reproductions Corporation
  • Applied Materials Inc.
  • Compugraphics International Limited
  • Dai Nippon Printing Co., Ltd.
  • HOYA Corporation
  • Infinite Graphics Incorporated
  • KLA Corporation
  • Lasertec Corporation
  • LG Innotek Co., Ltd.
  • Mycronic AB
  • Nippon Filcon Co., Ltd.
  • Photronics, Inc.
  • Qingyi Photomask Limited
  • SK-Electronics Co., Ltd.
  • Taiwan Mask Corporation（TMC）
Product Code: SMRC29490

According to Stratistics MRC, the Global Photomask Market is accounted for $5.81 billion in 2025 and is expected to reach $9.16 billion by 2032 growing at a CAGR of 6.7% during the forecast period. A photomask is a crucial tool used in photolithography for micro-fabrication, particularly in semiconductor manufacturing. It consists of a glass or quartz plate coated with an opaque material patterned to block light selectively. When exposed to ultraviolet (UV) light, the photomask transfers its pattern onto a photosensitive layer on a silicon wafer. This process enables the precise etching of intricate circuit designs essential for creating integrated circuits and other micro-devices.

According to a report by the U.S. According to the Department of Commerce, the sale of semiconductors in the United States grew 29% in 2021.

Market Dynamics:

Driver:

Rising investment in semiconductor R&D

Increasing research and development in semiconductor technology is fuelling innovations in photomask designs, improving their efficiency and durability. Advanced photomasks enable precise circuit patterning, a crucial aspect of semiconductor fabrication. The growing adoption of extreme ultraviolet (EUV) lithography is further driving investment in next-generation photomasks. Leading semiconductor manufacturers are expanding their R&D budgets to enhance photomask capabilities and reduce production costs. Additionally, collaborations between research institutions and industry players are accelerating photomask advancements.

Restraint:

High production costs

The development of photomasks requires sophisticated technologies and highly specialized equipment, leading to significant capital investment. The increasing complexity of integrated circuits demands advanced photomasks with stringent specifications, further driving up costs. Additionally, the production process involves expensive raw materials and intricate manufacturing techniques, making affordability a challenge. High operational costs can deter smaller manufacturers from entering the market, limiting industry expansion.

Opportunity:

Technological advancements in lithography

Advancements in lithography technologies are revolutionizing the photomask industry, enabling higher precision and efficiency in semiconductor manufacturing. The transition to EUV lithography is significantly enhancing the resolution and accuracy of photomasks, improving chip performance. Innovations such as optical proximity correction (OPC) and inverse lithography technology (ILT) are refining the design process. Additionally, the integration of computational lithography is streamlining photomask development, accelerating time-to-market for semiconductor products.

Threat:

Limited skilled workforce

The photomask industry requires highly skilled professionals with expertise in semiconductor lithography and optical engineering. However, there is a shortage of qualified engineers and technicians capable of handling advanced photomask development. The complexity of lithographic technologies and evolving industry standards make continuous skill development essential. Companies face challenges in recruiting and retaining specialized talent, impacting production efficiency and innovation. Workforce limitations may slow down the adoption of next-generation photomask technologies, affecting market growth.

Covid-19 Impact

The COVID-19 pandemic disrupted global semiconductor supply chains, affecting photomask production and distribution. Lockdowns and restrictions led to temporary shutdowns of manufacturing facilities, causing delays in semiconductor fabrication. However, the post-pandemic recovery witnessed a surge in semiconductor demand, driving investments in photomask development. The rise in remote work and electronic device usage further boosted semiconductor production, benefiting the photomask market.

The reticle segment is expected to be the largest during the forecast period

The reticle segment is expected to account for the largest market share during the forecast period, due to the continuous scaling of semiconductor devices, requiring high-precision patterning for advanced nodes. The adoption of EUV lithography and 3D IC packaging further fuels the need for complex reticle designs. Additionally, increased investment in AI, 5G, and automotive electronics accelerates the production of advanced chips, thereby boosting the demand for high-quality reticles in photomask fabrication processes

The electronics segment is expected to have the highest CAGR during the forecast period

Over the forecast period, the electronics segment is predicted to witness the highest growth rate, due to the rising demand for miniaturized and high-performance devices like smartphones, laptops, and IoT gadgets. As consumer expectations push for faster, smaller, and more energy-efficient electronics, semiconductor manufacturers require advanced photomasks for precise chip fabrication. Additionally, rapid innovation in display technologies, wearables, and smart home devices continues to fuel the need for high-resolution photomask solutions in electronics production.

Region with largest share:

During the forecast period, the Asia Pacific region is expected to hold the largest market share due to its dominance in semiconductor manufacturing. Countries like Taiwan, South Korea, China, and Japan host major semiconductor fabs, including TSMC, Samsung, and SK Hynix, fueling demand for advanced photomasks. Additionally, government initiatives and increased investments in semiconductor infrastructure further bolster the region's market growth.

Region with highest CAGR:

Over the forecast period, the North America region is anticipated to exhibit the highest CAGR, owing to the region's leadership in semiconductor research and development, particularly in advanced technologies like Extreme Ultraviolet (EUV) lithography, necessitates high-precision photomasks for smaller process nodes and intricate chip designs. Additionally, the increasing demand for consumer electronics, electric vehicles, and AI-driven applications further propels the need for advanced photomasks to meet the requirements of these sophisticated devices.

Key players in the market

Some of the key players profiled in the Photomask Market include Advance Reproductions Corporation, Applied Materials Inc., Compugraphics International Limited, Dai Nippon Printing Co., Ltd., HOYA Corporation, Infinite Graphics Incorporated, KLA Corporation, Lasertec Corporation, LG Innotek Co., Ltd., Mycronic AB, Nippon Filcon Co., Ltd., Photronics, Inc., Qingyi Photomask Limited, SK-Electronics Co., Ltd., and Taiwan Mask Corporation (TMC).

Key Developments:

In April 2025, Applied Materials, Inc. announced it has purchased 9 percent of the outstanding shares of the common stock of BE Semiconductor Industries N.V. (Besi), a leading manufacturer of assembly equipment for the semiconductor industry. Applied and Besi have been successfully collaborating since 2020, and recently extended their agreement, to co-develop the industry's first fully integrated equipment solution for die-based hybrid bonding.

In June 2016, Advance Reproductions Corp. is pleased to announce the installation of its Next-Generation Laser Writer for Photomask manufacturing. The Mycronic FPS5500 is the latest technology offering from Mycronic AB, Taby, Sweden. Installation was completed in July 2016 and is currently in production for photomask manufacturing.

Product Types Covered:

  • Reticle
  • Master Mask
  • Copy Mask
  • Other Product Types

Mask Types Covered:

  • Binary Mask
  • Phase Shift Mask (PSM)
  • Extreme Ultraviolet (EUV) Mask
  • Other Mask Types

Technology Nodes Covered:

  • Legacy Nodes (28nm and Above)
  • 10nm to 14nm
  • 3nm to 10nm

Applications Covered:

  • Displays
  • Discrete Components
  • Optical Devices
  • MEMS
  • Semiconductor & IC
  • Flat Panel Displays
  • Other Applications

End Users Covered:

  • Electronics
  • Automotive
  • Telecommunications
  • Aerospace & Defense
  • Healthcare
  • Other End Users

Regions Covered:

  • North America
    • US
    • Canada
    • Mexico
  • Europe
    • Germany
    • UK
    • Italy
    • France
    • Spain
    • Rest of Europe
  • Asia Pacific
    • Japan
    • China
    • India
    • Australia
    • New Zealand
    • South Korea
    • Rest of Asia Pacific
  • South America
    • Argentina
    • Brazil
    • Chile
    • Rest of South America
  • Middle East & Africa
    • Saudi Arabia
    • UAE
    • Qatar
    • South Africa
    • Rest of Middle East & Africa

What our report offers:

  • Market share assessments for the regional and country-level segments
  • Strategic recommendations for the new entrants
  • Covers Market data for the years 2022, 2023, 2024, 2026, and 2030
  • Market Trends (Drivers, Constraints, Opportunities, Threats, Challenges, Investment Opportunities, and recommendations)
  • Strategic recommendations in key business segments based on the market estimations
  • Competitive landscaping mapping the key common trends
  • Company profiling with detailed strategies, financials, and recent developments
  • Supply chain trends mapping the latest technological advancements

Free Customization Offerings:

All the customers of this report will be entitled to receive one of the following free customization options:

  • Company Profiling
    • Comprehensive profiling of additional market players (up to 3)
    • SWOT Analysis of key players (up to 3)
  • Regional Segmentation
    • Market estimations, Forecasts and CAGR of any prominent country as per the client's interest (Note: Depends on feasibility check)
  • Competitive Benchmarking
    • Benchmarking of key players based on product portfolio, geographical presence, and strategic alliances

Table of Contents

1 Executive Summary

2 Preface

  • 2.1 Abstract
  • 2.2 Stake Holders
  • 2.3 Research Scope
  • 2.4 Research Methodology
    • 2.4.1 Data Mining
    • 2.4.2 Data Analysis
    • 2.4.3 Data Validation
    • 2.4.4 Research Approach
  • 2.5 Research Sources
    • 2.5.1 Primary Research Sources
    • 2.5.2 Secondary Research Sources
    • 2.5.3 Assumptions

3 Market Trend Analysis

  • 3.1 Introduction
  • 3.2 Drivers
  • 3.3 Restraints
  • 3.4 Opportunities
  • 3.5 Threats
  • 3.6 Technology Analysis
  • 3.7 Application Analysis
  • 3.8 End User Analysis
  • 3.9 Emerging Markets
  • 3.10 Impact of Covid-19

4 Porters Five Force Analysis

  • 4.1 Bargaining power of suppliers
  • 4.2 Bargaining power of buyers
  • 4.3 Threat of substitutes
  • 4.4 Threat of new entrants
  • 4.5 Competitive rivalry

5 Global Photomask Market, By Product Type

  • 5.1 Introduction
  • 5.2 Reticle
  • 5.3 Master Mask
  • 5.4 Copy Mask
  • 5.5 Other Product Types

6 Global Photomask Market, By Mask Type

  • 6.1 Introduction
  • 6.2 Binary Mask
  • 6.3 Phase Shift Mask (PSM)
  • 6.4 Extreme Ultraviolet (EUV) Mask
  • 6.5 Other Mask Types

7 Global Photomask Market, By Technology Node

  • 7.1 Introduction
  • 7.2 Legacy Nodes (28nm and Above)
  • 7.3 10nm to 14nm
  • 7.4 3nm to 10nm

8 Global Photomask Market, By Application

  • 8.1 Introduction
  • 8.2 Displays
  • 8.3 Discrete Components
  • 8.4 Optical Devices
  • 8.5 MEMS
  • 8.6 Semiconductor & IC
  • 8.7 Flat Panel Displays
  • 8.8 Other Applications

9 Global Photomask Market, By End User

  • 9.1 Introduction
  • 9.2 Electronics
  • 9.3 Automotive
  • 9.4 Telecommunications
  • 9.5 Aerospace & Defense
  • 9.6 Healthcare
  • 9.7 Other End Users

10 Global Photomask Market, By Geography

  • 10.1 Introduction
  • 10.2 North America
    • 10.2.1 US
    • 10.2.2 Canada
    • 10.2.3 Mexico
  • 10.3 Europe
    • 10.3.1 Germany
    • 10.3.2 UK
    • 10.3.3 Italy
    • 10.3.4 France
    • 10.3.5 Spain
    • 10.3.6 Rest of Europe
  • 10.4 Asia Pacific
    • 10.4.1 Japan
    • 10.4.2 China
    • 10.4.3 India
    • 10.4.4 Australia
    • 10.4.5 New Zealand
    • 10.4.6 South Korea
    • 10.4.7 Rest of Asia Pacific
  • 10.5 South America
    • 10.5.1 Argentina
    • 10.5.2 Brazil
    • 10.5.3 Chile
    • 10.5.4 Rest of South America
  • 10.6 Middle East & Africa
    • 10.6.1 Saudi Arabia
    • 10.6.2 UAE
    • 10.6.3 Qatar
    • 10.6.4 South Africa
    • 10.6.5 Rest of Middle East & Africa

11 Key Developments

  • 11.1 Agreements, Partnerships, Collaborations and Joint Ventures
  • 11.2 Acquisitions & Mergers
  • 11.3 New Product Launch
  • 11.4 Expansions
  • 11.5 Other Key Strategies

12 Company Profiling

  • 12.1 Advance Reproductions Corporation
  • 12.2 Applied Materials Inc.
  • 12.3 Compugraphics International Limited
  • 12.4 Dai Nippon Printing Co., Ltd.
  • 12.5 HOYA Corporation
  • 12.6 Infinite Graphics Incorporated
  • 12.7 KLA Corporation
  • 12.8 Lasertec Corporation
  • 12.9 LG Innotek Co., Ltd.
  • 12.10 Mycronic AB
  • 12.11 Nippon Filcon Co., Ltd.
  • 12.12 Photronics, Inc.
  • 12.13 Qingyi Photomask Limited
  • 12.14 SK-Electronics Co., Ltd.
  • 12.15 Taiwan Mask Corporation (TMC)

List of Tables

  • Table 1 Global Photomask Market Outlook, By Region (2024-2032) ($MN)
  • Table 2 Global Photomask Market Outlook, By Product Type (2024-2032) ($MN)
  • Table 3 Global Photomask Market Outlook, By Reticle (2024-2032) ($MN)
  • Table 4 Global Photomask Market Outlook, By Master Mask (2024-2032) ($MN)
  • Table 5 Global Photomask Market Outlook, By Copy Mask (2024-2032) ($MN)
  • Table 6 Global Photomask Market Outlook, By Other Product Types (2024-2032) ($MN)
  • Table 7 Global Photomask Market Outlook, By Mask Type (2024-2032) ($MN)
  • Table 8 Global Photomask Market Outlook, By Binary Mask (2024-2032) ($MN)
  • Table 9 Global Photomask Market Outlook, By Phase Shift Mask (PSM) (2024-2032) ($MN)
  • Table 10 Global Photomask Market Outlook, By Extreme Ultraviolet (EUV) Mask (2024-2032) ($MN)
  • Table 11 Global Photomask Market Outlook, By Other Mask Types (2024-2032) ($MN)
  • Table 12 Global Photomask Market Outlook, By Technology Node (2024-2032) ($MN)
  • Table 13 Global Photomask Market Outlook, By Legacy Nodes (28nm and Above) (2024-2032) ($MN)
  • Table 14 Global Photomask Market Outlook, By 10nm to 14nm (2024-2032) ($MN)
  • Table 15 Global Photomask Market Outlook, By 3nm to 10nm (2024-2032) ($MN)
  • Table 16 Global Photomask Market Outlook, By Application (2024-2032) ($MN)
  • Table 17 Global Photomask Market Outlook, By Displays (2024-2032) ($MN)
  • Table 18 Global Photomask Market Outlook, By Discrete Components (2024-2032) ($MN)
  • Table 19 Global Photomask Market Outlook, By Optical Devices (2024-2032) ($MN)
  • Table 20 Global Photomask Market Outlook, By MEMS (2024-2032) ($MN)
  • Table 21 Global Photomask Market Outlook, By Semiconductor & IC (2024-2032) ($MN)
  • Table 22 Global Photomask Market Outlook, By Flat Panel Displays (2024-2032) ($MN)
  • Table 23 Global Photomask Market Outlook, By Other Applications (2024-2032) ($MN)
  • Table 24 Global Photomask Market Outlook, By End User (2024-2032) ($MN)
  • Table 25 Global Photomask Market Outlook, By Electronics (2024-2032) ($MN)
  • Table 26 Global Photomask Market Outlook, By Automotive (2024-2032) ($MN)
  • Table 27 Global Photomask Market Outlook, By Telecommunications (2024-2032) ($MN)
  • Table 28 Global Photomask Market Outlook, By Aerospace & Defense (2024-2032) ($MN)
  • Table 29 Global Photomask Market Outlook, By Healthcare (2024-2032) ($MN)
  • Table 30 Global Photomask Market Outlook, By Other End Users (2024-2032) ($MN)

Note: Tables for North America, Europe, APAC, South America, and Middle East & Africa Regions are also represented in the same manner as above.