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市場調查報告書
商品編碼
1867522
掩模坯料:全球市場佔有率和排名、總收入和需求預測(2025-2031年)Mask Blanks - Global Market Share and Ranking, Overall Sales and Demand Forecast 2025-2031 |
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2024年全球掩模坯市場規模預計為31.61億美元,預計到2031年將成長至47.78億美元,2025年至2031年的複合年成長率為6.1%。
本報告對近期關稅調整和國際戰略反制措施對口罩坯料跨境產業佈局、資本配置模式、區域經濟相互依存關係和供應鏈重組的影響進行了全面評估。
掩模坯主要由石英玻璃或鈉鈣玻璃基板構成,基板上塗覆有一層薄薄的鉻或鉬矽化物薄膜。掩模坯經電子束或雷射光束照射後,塗覆一層耐蝕刻的光敏抗蝕劑劑,從而形成電路圖案。
全球主要企業包括信越微矽株式會社、HOYA株式會社、AGC株式會社、S&S Tech和ULCOAT。前五大廠商佔據了超過90%的市場。依產品類型分類,低反射鉻膜遮罩版是最大的細分市場,市佔率約66%。依應用領域分類,半導體應用領域為最大的應用領域,市佔率約55%。
市場主要促進因素包括:
1. 半導體產業需求不斷成長
,拓展下游應用
5G 和 AI主導:5G基地台、AI 晶片和汽車電子等領域對高性能半導體的需求激增,推動了採用 28nm 及以上製程技術的晶片生產的擴張。
向先進製程過渡:低於 28nm 的製程(例如 7nm 和 5nm)需要奈米級精度的掩模基板,由於合成石英基基板具有高透射率和低熱膨脹係數,因此是最佳選擇。
加速國內替代:國內企業(如菲利華和路威光電)突破了技術壁壘,預計國內生產率將從 2018 年的不到 10% 上升到 2025 年的 30%,並在 2027 年超過 50%。
獨立第三方掩模製造商的市佔率正在擴大,晶圓廠成熟製程(28nm及以上)的外包比例已增加至47.3%。 2.顯示面板產業正變得越來越複雜。
2. 螢幕尺寸增加的趨勢
高世代生產線建設:隨著第 8.6 代(例如,第 10.5 代)及以上面板生產線的增加,對大尺寸光掩模坯的需求不斷成長,基板尺寸也從第 5 代的 1 米 x 1 米擴大到第 11 代的 3 米 x 3 米。
技術創新:AMOLED、LTPO 和 LTPS 等新型顯示技術需要亞微米級精度的掩模基板,從而推動了對高階基板的需求。
3. 技術進步與材料創新
合成石英基基板的優勢
優異的性能:高純度(雜質含量<10 ppb)、低熱膨脹係數(<0.1 ppm/ 度C)和高穿透率(200 nm波長下>90%)使其適用於DUV/EUV微影術。
製程創新:國內製造商已將缺陷密度從每平方英吋 15 個缺陷降低到每平方英吋 5 個缺陷,達到第五代生產線的准入標準。
塗層製程改進
鉬矽二元光屏蔽層(OMOG):由工業株式會社開發,該技術取代了傳統的鉻層,提高了穩定性和蝕刻性能,推動了對高階基板的需求。
適應 EUV 技術:反射掩模基板(由 Ken Kinoshita 等人獲得專利)已適應極紫外光刻技術,並已成為 7 nm 以下製程的重要材料。
4. 政策支持與產業鏈聯繫
促進國家政策
本地化目標:諸如「中國製造2025」之類的政策明確設定了2025年將半導體材料的本地化率提高到50%的目標。
資金支持:嘉興聯半導體已為該計劃投資30億元人民幣,並建立了完整的光掩模材料供應鏈。
產業鏈整合
垂直整合:路威光電已建立從 G2.5 到 G11 的全代掩模生產能力,而 菲利華 已實現從石英砂到基板的垂直整合。
設備在地化:新機微電子公司交付了一台 90nm 節點直接成像曝光工具,降低了該公司對進口設備的依賴。
5. 市場競爭的變化
打破國際壟斷
日韓公司佔據主導地位:工業和東曹晶佔據高階市場 50% 的佔有率,但國內公司正透過技術認證逐步進入市場(例如飛華的東京電子認證)。
6. 成本與供應鏈因素
最佳化原料成本
合成石英的規模化生產:飛華科技大規模生產 G8.5 代基板降低了單位價格,促進了高階基板價格的下降。
國產設備:國產微影術設備(例如Core Micro的90nm設備)具有顯著的價格優勢,並提高了掩模坯的生產效率。
光掩模坯市場的核心促進因素包括半導體和顯示面板產業需求的成長、合成石英等高階材料的技術突破、本土化政策和產業鏈整合,以及對5G/AI等新興應用的技術適應。展望未來,隨著EUV技術的普及和國內企業技術能力的提升,高階生產、本土化和規模擴張預計將同步推進。
本報告旨在透過按地區/國家、類型和應用進行分析,全面概述全球掩模坯市場,重點關注總銷售量、收入、價格、市場佔有率和主要企業的排名。
掩模坯市場規模、估算和預測以銷量(千平方公尺)和收入(百萬美元)為單位呈現,以2024年為基準年,並包含2020年至2031年的歷史數據和預測數據。我們運用定量和定性分析,幫助讀者制定業務/成長策略,評估市場競爭,分析自身在當前市場中的地位,並就掩模坯做出明智的商業決策。
市場區隔
公司
按類型分類的細分市場
應用領域
按地區
The global market for Mask Blanks was estimated to be worth US$ 3161 million in 2024 and is forecast to a readjusted size of US$ 4778 million by 2031 with a CAGR of 6.1% during the forecast period 2025-2031.
This report provides a comprehensive assessment of recent tariff adjustments and international strategic countermeasures on Mask Blanks cross-border industrial footprints, capital allocation patterns, regional economic interdependencies, and supply chain reconfigurations.
Mask Blanks are the products which are formed from a chrome or molybdenum silicide based thin film on mainly quartz or soda-lime glass substrate. And they are coated by photosensitive resist materials which sensitive for electron or laser beam and resist for etching process to make circuit patterns.
Global key players of Mask Blanks include Shin-Etsu MicroSi, Inc., HOYA, AGC, S&S Tech and ULCOAT. The top five players hold a share over 90%. In terms of product, low reflectance chrome-film mask blanks are the largest segment, with a share about 66%. And in terms of application, the largest application is Semiconductor, with a share about 55%.
The main market drivers include the following:
1. Growing demand in the semiconductor industry
Expanding downstream applications
5G and AI-driven: Surges in demand for high-performance semiconductors in areas such as 5G base stations, AI chips, and automotive electronics are driving production growth for chips with process technology of 28nm and above.
Advanced process upgrades: Processes below 28nm (such as 7nm and 5nm) require mask substrates with precision down to the nanometer level, with synthetic quartz substrates becoming the preferred choice due to their high transmittance and low thermal expansion coefficient.
Accelerated domestic substitution: Domestic companies (such as Philihua and Luwei Optoelectronics) have broken through technological barriers, increasing the domestic production rate from less than 10% in 2018 to 30% in 2025, and projected to exceed 50% in 2027.
Independent third-party mask manufacturers are expanding their market share, and wafer fabs are increasing the proportion of outsourced manufacturing for mature processes (above 28nm) to 47.3%. 2. Display Panel Industry Upgrade
2.Large-Screen Trend
High-Generation Line Construction: The increase in panel production lines for Generation 8.6 and above (such as Generation 10.5) is driving demand for large photomask blanks, with substrate sizes expanding from 1mX1m in Generation 5 to 3mX3m in Generation 11.
Technological Iteration: New display technologies such as AMOLED/LTPO/LTPS require submicron precision for mask substrates, driving demand for high-end substrates.
3. Technological Advancement and Material Innovation
Advantages of Synthetic Quartz Substrates
Excellent Performance: High purity (impurity content <10ppb), low thermal expansion coefficient (<0.1ppm/°C), and transmittance (>90% at 200nm wavelength), making them suitable for DUV/EUV lithography.
Process Breakthrough: Domestic companies have reduced defect density from 15 defects per square inch to 5 defects per square inch, meeting the entry standard for Generation 5 lines.
Coating Process Improvements
Molybdenum-silicon binary light shielding layer (OMOG): Shin-Etsu Chemical has developed an alternative to the traditional chromium layer, improving stability and etching performance, driving demand for high-end substrates.
EUV Technology Adaptation: Reflective mask substrates (such as those patented by Ken Kinoshita) are adapted for extreme ultraviolet lithography, becoming a key material for processes below 7nm.
4. Policy Support and Industry Chain Collaboration
National Policy Promotion
Localization Target: "Made in China 2025" and other policies clearly define increasing the localization rate of semiconductor materials, with a target of 50% by 2025.
Financial Support: Jiaxing Lien Semiconductor invested 3 billion yuan in the project, establishing a complete supply chain for photomask materials.
Industry Chain Integration
Vertical Integration: Luwei Optoelectronics has established full-generation mask production capacity from G2.5 to G11, and Philihua has achieved vertical integration from quartz sand to substrates.
Equipment Localization: Xinji Micro-Equipment has delivered 90nm node direct-write lithography equipment, reducing dependence on imported equipment.
5. Changing Market Competition Landscape
Breaking International Monopoly
Dominated by Japanese and Korean Companies: Shin-Etsu Chemical and Tosoh Quartz Crystal hold a 50% share of the high-end market, but domestic companies are gradually penetrating through technical certifications (e.g., Philihua's Tokyo Electron certification).
6. Cost and Supply Chain Factors
Raw Material Cost Optimization
Scale-up of Synthetic Quartz: Philihua's G8.5-generation substrate mass production has reduced unit costs, driving down prices for high-end substrates.
Equipment Localization: Domestic photolithography equipment (e.g., Core Micro's 90nm equipment) offers significant price advantages, improving mask blank production efficiency.
The core drivers of the Mask Blanks market include: escalating demand from the semiconductor and display panel industries, technological breakthroughs in high-end materials like synthetic quartz, localization policies and industry chain integration, and technological adaptation to emerging applications such as 5G/AI. In the future, with the widespread adoption of EUV technology and the improvement of domestic companies' technological capabilities, the market will exhibit a parallel trend of high-end production, localization, and scale.
This report aims to provide a comprehensive presentation of the global market for Mask Blanks, focusing on the total sales volume, sales revenue, price, key companies market share and ranking, together with an analysis of Mask Blanks by region & country, by Type, and by Application.
The Mask Blanks market size, estimations, and forecasts are provided in terms of sales volume (K Sqm) and sales revenue ($ millions), considering 2024 as the base year, with history and forecast data for the period from 2020 to 2031. With both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Mask Blanks.
Market Segmentation
By Company
Segment by Type
Segment by Application
By Region
Chapter Outline
Chapter 1: Introduces the report scope of the report, global total market size (value, volume and price). This chapter also provides the market dynamics, latest developments of the market, the driving factors and restrictive factors of the market, the challenges and risks faced by manufacturers in the industry, and the analysis of relevant policies in the industry.
Chapter 2: Detailed analysis of Mask Blanks manufacturers competitive landscape, price, sales and revenue market share, latest development plan, merger, and acquisition information, etc.
Chapter 3: Provides the analysis of various market segments by Type, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different market segments.
Chapter 4: Provides the analysis of various market segments by Application, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different downstream markets.
Chapter 5: Sales, revenue of Mask Blanks in regional level. It provides a quantitative analysis of the market size and development potential of each region and introduces the market development, future development prospects, market space, and market size of each country in the world.
Chapter 6: Sales, revenue of Mask Blanks in country level. It provides sigmate data by Type, and by Application for each country/region.
Chapter 7: Provides profiles of key players, introducing the basic situation of the main companies in the market in detail, including product sales, revenue, price, gross margin, product introduction, recent development, etc.
Chapter 8: Analysis of industrial chain, including the upstream and downstream of the industry.
Chapter 9: Conclusion.