微影術計量設備市場規模、佔有率和成長分析(按設備類型、技術、應用、最終用戶產業、自動化程度和地區分類)-產業預測,2026-2033年
市場調查報告書
商品編碼
1901930

微影術計量設備市場規模、佔有率和成長分析(按設備類型、技術、應用、最終用戶產業、自動化程度和地區分類)-產業預測,2026-2033年

Lithography Metrology Equipment Market Size, Share, and Growth Analysis, By Type of Equipment, By Technology, By Application, By End-User Industry, By Level of Automation, By Region - Industry Forecast 2026-2033

出版日期: | 出版商: SkyQuest | 英文 202 Pages | 商品交期: 3-5個工作天內

價格
簡介目錄

全球微影術計量設備市場預計到 2024 年將達到 37.4 億美元,到 2025 年將達到 40 億美元,到 2033 年將達到 68.2 億美元,預測期(2026-2033 年)的複合年成長率為 6.9%。

在半導體產業,微影術計量設備市場對於確保積體電路製造所需的精度至關重要。隨著產業朝向更小的節點尺寸和更複雜的設計發展,對高解析度計量工具的需求呈現爆炸性成長。關鍵成長要素包括對小型化的不懈追求、家用電子電器需求的不斷成長以及5G、人工智慧和物聯網(IoT)等技術的興起。計量設備確保製造商滿足裝置最佳性能所需的嚴格公差。光學和成像技術的進步催生了能夠進行奈米級測量的精密系統,從而提升了尖端積體電路生產的品管。此外,隨著向極紫外光刻技術的過渡,能夠有效支援這些創新光刻製程的計量解決方案也至關重要。

全球微影術計量設備市場促進因素

對更小、更有效率電子設備的不懈追求推動了半導體製造技術的顯著進步。在此背景下,微影術計量設備對於在整個製造過程中保持精度至關重要。隨著晶片尺寸的縮小和複雜性的增加,對先進計量工具的需求也隨之成長。這種對先進計量設備日益成長的需求正在推動微影術計量設備市場的發展,製造商不僅致力於提升生產能力,也力求應對半導體領域最尖端科技創新帶來的挑戰。

限制全球微影術計量設備市場的因素

全球微影術計量設備市場面臨許多挑戰,其中涉及的先進技術包括複雜的光學元件、感測器和軟體。這種複雜性需要大量的初始投資和持續的維護成本,這對中小製造商和研究機構造成了財務障礙。因此,這些機構可能不願意採用最新的計量解決方案,限制了其市場競爭力。購置和維護先進微影術計量設備的高成本可能會限制市場成長和創新,因為只有擁有充足資源的大型企業才能充分利用這些先進技術。

全球微影術測量設備市場趨勢

全球微影術計量設備市場正經歷著一個顯著的發展趨勢,其特點是先進技術的融合,以滿足半導體製造不斷變化的需求。隨著製程日益複雜,設備也在不斷改進,以提供更高的精度、準確度和效率。關鍵的進步包括採用先進的成像技術,例如多模態成像和多光束成像,以及利用人工智慧 (AI) 和機器學習進行即時數據分析和最佳化。這一趨勢體現了企業積極應對規模化挑戰的態度,並認知到提高半導體製造的製程控制至關重要,這能確保製造商保持競爭優勢。

目錄

介紹

  • 調查目標
  • 調查範圍
  • 定義

調查方法

  • 資訊收集
  • 二手資料和一手資料方法
  • 市場規模預測
  • 市場假設與限制

執行摘要

  • 全球市場展望
  • 供需趨勢分析
  • 細分市場機會分析

市場動態與展望

  • 市場規模
  • 市場動態
    • 促進因素和機遇
    • 限制與挑戰
  • 波特分析

關鍵市場考察

  • 關鍵成功因素
  • 競爭程度
  • 關鍵投資機會
  • 市場生態系統
  • 市場吸引力指數(2025)
  • PESTEL 分析
  • 總體經濟指標
  • 價值鏈分析
  • 定價分析

全球微影術計量設備市場規模(按設備類型和複合年成長率分類)(2026-2033 年)

  • 光學微影術測量設備
  • X光微影術測量設備
  • 電子束微影術測量設備
  • 掩模/蝕刻微影術測量設備
  • 其他微影術計量工具

全球微影術計量設備市場依技術及複合年成長率分類(2026-2033 年)

  • 接觸式光刻
  • 近距離暴露
  • 投影光刻
  • 極紫外線(EUV)光刻
  • 下一代微影術(NGL)

全球微影術計量設備市場規模(按應用及複合年成長率分類)(2026-2033 年)

  • 半導體製造
  • 微機電系統(MEMS)
  • 印刷基板(PCB)製造
  • 光子裝置
  • 奈米科技

全球微影術計量設備市場規模(按終端用戶產業分類)及複合年成長率(2026-2033 年)

  • 家用電子電器
  • 電訊
  • 衛生保健
  • 航太/國防

全球微影術計量設備市場按自動化程度和複合年成長率分類(2026-2033 年)

  • 全自動微影術測量設備
  • 半自動微影術測量設備
  • 手動微影術計量設備

全球微影術計量設備市場規模及複合年成長率(2026-2033)

  • 北美洲
    • 美國
    • 加拿大
  • 歐洲
    • 德國
    • 西班牙
    • 法國
    • 英國
    • 義大利
    • 其他歐洲
  • 亞太地區
    • 中國
    • 印度
    • 日本
    • 韓國
    • 亞太其他地區
  • 拉丁美洲
    • 巴西
    • 其他拉丁美洲
  • 中東和非洲
    • 海灣合作理事會國家
    • 南非
    • 其他中東和非洲地區

競爭資訊

  • 前五大公司對比
  • 主要企業的市場定位(2025 年)
  • 主要市場參與者所採取的策略
  • 近期市場趨勢
  • 公司市佔率分析(2025 年)
  • 主要企業公司簡介
    • 公司詳情
    • 產品系列分析
    • 依業務板塊進行公司股票分析
    • 2023-2025年營收年比比較

主要企業簡介

  • ASML Holding NV(Netherlands)
  • KLA Corporation(US)
  • Applied Materials, Inc.(US)
  • Nikon Corporation(Japan)
  • Canon Inc.(Japan)
  • Tokyo Electron Limited(Japan)
  • Hitachi High-Technologies Corporation(Japan)
  • Veeco Instruments Inc.(US)
  • SUSS MicroTec SE(Germany)
  • EV Group(Austria)
  • Advantest Corporation(Japan)
  • Nova Measuring Instruments Ltd.(Israel)
  • Rudolph Technologies, Inc.(US)
  • Onto Innovation Inc.(US)
  • Zeiss(Germany)
  • Oxford Instruments plc(UK)
  • SEMATECH(US)
  • IMEC(Belgium)
  • Fraunhofer Institute(Germany)

結論與建議

簡介目錄
Product Code: SQMIG20I2173

Global Lithography Metrology Equipment Market size was valued at USD 3.74 Billion in 2024 and is poised to grow from USD 4 Billion in 2025 to USD 6.82 Billion by 2033, growing at a CAGR of 6.9% during the forecast period (2026-2033).

The Global Lithography Metrology Equipment Market is essential in the semiconductor sector, ensuring the precision needed for integrated circuit manufacturing. As the industry progresses toward smaller node sizes and more intricate designs, the demand for high-resolution metrology tools has skyrocketed. Key growth drivers include the relentless pursuit of miniaturization, increased consumer electronics demand, and the emergence of technologies like 5G, artificial intelligence, and the Internet of Things. Metrology equipment ensures manufacturers meet stringent tolerances required for optimal device performance. Technological advancements in optical and imaging technologies have produced sophisticated systems capable of nanoscale measurements, enhancing quality control in cutting-edge IC production. Furthermore, the shift toward extreme ultraviolet lithography necessitates metrology solutions that effectively support these innovative lithography processes.

Top-down and bottom-up approaches were used to estimate and validate the size of the Global Lithography Metrology Equipment market and to estimate the size of various other dependent submarkets. The research methodology used to estimate the market size includes the following details: The key players in the market were identified through secondary research, and their market shares in the respective regions were determined through primary and secondary research. This entire procedure includes the study of the annual and financial reports of the top market players and extensive interviews for key insights from industry leaders such as CEOs, VPs, directors, and marketing executives. All percentage shares split, and breakdowns were determined using secondary sources and verified through Primary sources. All possible parameters that affect the markets covered in this research study have been accounted for, viewed in extensive detail, verified through primary research, and analyzed to get the final quantitative and qualitative data.

Global Lithography Metrology Equipment Market Segments Analysis

Global Lithography Metrology Equipment Market is segmented by Type of Equipment, Technology, Application, End-User Industry, Level of Automation and region. Based on Type of Equipment, the market is segmented into Optical Lithography Metrology Equipment, X-ray Lithography Metrology Equipment, E-Beam Lithography Metrology Equipment, Mask/Etch Metrology Equipment and Other Lithography Metrology Equipment. Based on Technology, the market is segmented into Contact Lithography, Proximity Lithography, Projection Lithography, Extreme Ultraviolet (EUV) Lithography and Next-Generation Lithography (NGL). Based on Application, the market is segmented into Semiconductor Manufacturing, Microelectromechanical Systems (MEMS), Printed Circuit Board (PCB) Production, Photonic Devices and Nanotechnology. Based on End-User Industry, the market is segmented into Consumer Electronics, Telecommunications, Automotive, Healthcare and Aerospace and Defense. Based on Level of Automation, the market is segmented into Fully Automated Lithography Metrology Equipment, Semi-Automated Lithography Metrology Equipment and Manual Lithography Metrology Equipment. Based on region, the market is segmented into North America, Europe, Asia Pacific, Latin America and Middle East & Africa.

Driver of the Global Lithography Metrology Equipment Market

The relentless pursuit of smaller and more efficient electronic devices has spurred significant advancements in semiconductor manufacturing technologies. In this context, lithography metrology equipment is essential for maintaining accuracy and precision throughout the fabrication process. As the features of chips become increasingly minute and intricate, the demand for advanced metrology tools escalates correspondingly. This growing need for sophisticated measurement instruments not only enhances the manufacturing capabilities but also drives the market for lithography metrology equipment, as manufacturers strive to meet the challenges posed by cutting-edge technological innovations in the semiconductor sector.

Restraints in the Global Lithography Metrology Equipment Market

The Global Lithography Metrology Equipment market faces challenges due to the advanced technology involved, which encompasses intricate optics, sensors, and software. This complexity contributes to significant initial investment and ongoing maintenance expenses, creating financial barriers for smaller manufacturers and research institutions. As a result, these entities may be hesitant to embrace the latest metrology solutions, limiting their ability to remain competitive in the market. The high costs associated with acquiring and maintaining sophisticated lithography metrology equipment can restrict market growth and innovation as only larger players with sufficient resources can fully leverage these advanced technologies.

Market Trends of the Global Lithography Metrology Equipment Market

The global lithography metrology equipment market is experiencing a significant trend characterized by the integration of advanced technologies to meet the evolving demands of semiconductor manufacturing. As processes grow increasingly complex, the equipment is adapting to deliver enhanced precision, accuracy, and efficiency. Key advancements include the implementation of sophisticated imaging techniques, such as multi-modal and multi-beam imaging, alongside the utilization of artificial intelligence (AI) and machine learning for real-time data analysis and optimization. This trend reflects a proactive approach to tackle the challenges of shrinking feature sizes and the critical need for improved process control in semiconductor fabrication, ensuring manufacturers can maintain competitive advantages.

Table of Contents

Introduction

  • Objectives of the Study
  • Scope of the Report
  • Definitions

Research Methodology

  • Information Procurement
  • Secondary & Primary Data Methods
  • Market Size Estimation
  • Market Assumptions & Limitations

Executive Summary

  • Global Market Outlook
  • Supply & Demand Trend Analysis
  • Segmental Opportunity Analysis

Market Dynamics & Outlook

  • Market Overview
  • Market Size
  • Market Dynamics
    • Drivers & Opportunities
    • Restraints & Challenges
  • Porters Analysis
    • Competitive rivalry
    • Threat of substitute
    • Bargaining power of buyers
    • Threat of new entrants
    • Bargaining power of suppliers

Key Market Insights

  • Key Success Factors
  • Degree of Competition
  • Top Investment Pockets
  • Market Ecosystem
  • Market Attractiveness Index, 2025
  • PESTEL Analysis
  • Macro-Economic Indicators
  • Value Chain Analysis
  • Pricing Analysis

Global Lithography Metrology Equipment Market Size by Type of Equipment & CAGR (2026-2033)

  • Market Overview
  • Optical Lithography Metrology Equipment
  • X-ray Lithography Metrology Equipment
  • E-Beam Lithography Metrology Equipment
  • Mask/Etch Metrology Equipment
  • Other Lithography Metrology Equipment

Global Lithography Metrology Equipment Market Size by Technology & CAGR (2026-2033)

  • Market Overview
  • Contact Lithography
  • Proximity Lithography
  • Projection Lithography
  • Extreme Ultraviolet (EUV) Lithography
  • Next-Generation Lithography (NGL)

Global Lithography Metrology Equipment Market Size by Application & CAGR (2026-2033)

  • Market Overview
  • Semiconductor Manufacturing
  • Microelectromechanical Systems (MEMS)
  • Printed Circuit Board (PCB) Production
  • Photonic Devices
  • Nanotechnology

Global Lithography Metrology Equipment Market Size by End-User Industry & CAGR (2026-2033)

  • Market Overview
  • Consumer Electronics
  • Telecommunications
  • Automotive
  • Healthcare
  • Aerospace and Defense

Global Lithography Metrology Equipment Market Size by Level of Automation & CAGR (2026-2033)

  • Market Overview
  • Fully Automated Lithography Metrology Equipment
  • Semi-Automated Lithography Metrology Equipment
  • Manual Lithography Metrology Equipment

Global Lithography Metrology Equipment Market Size & CAGR (2026-2033)

  • North America (Type of Equipment, Technology, Application, End-User Industry, Level of Automation)
    • US
    • Canada
  • Europe (Type of Equipment, Technology, Application, End-User Industry, Level of Automation)
    • Germany
    • Spain
    • France
    • UK
    • Italy
    • Rest of Europe
  • Asia Pacific (Type of Equipment, Technology, Application, End-User Industry, Level of Automation)
    • China
    • India
    • Japan
    • South Korea
    • Rest of Asia-Pacific
  • Latin America (Type of Equipment, Technology, Application, End-User Industry, Level of Automation)
    • Brazil
    • Rest of Latin America
  • Middle East & Africa (Type of Equipment, Technology, Application, End-User Industry, Level of Automation)
    • GCC Countries
    • South Africa
    • Rest of Middle East & Africa

Competitive Intelligence

  • Top 5 Player Comparison
  • Market Positioning of Key Players, 2025
  • Strategies Adopted by Key Market Players
  • Recent Developments in the Market
  • Company Market Share Analysis, 2025
  • Company Profiles of All Key Players
    • Company Details
    • Product Portfolio Analysis
    • Company's Segmental Share Analysis
    • Revenue Y-O-Y Comparison (2023-2025)

Key Company Profiles

  • ASML Holding N.V. (Netherlands)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • KLA Corporation (US)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Applied Materials, Inc. (US)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Nikon Corporation (Japan)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Canon Inc. (Japan)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Tokyo Electron Limited (Japan)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Hitachi High-Technologies Corporation (Japan)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Veeco Instruments Inc. (US)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • SUSS MicroTec SE (Germany)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • EV Group (Austria)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Advantest Corporation (Japan)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Nova Measuring Instruments Ltd. (Israel)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Rudolph Technologies, Inc. (US)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Onto Innovation Inc. (US)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Zeiss (Germany)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Oxford Instruments plc (UK)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • SEMATECH (US)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • IMEC (Belgium)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments
  • Fraunhofer Institute (Germany)
    • Company Overview
    • Business Segment Overview
    • Financial Updates
    • Key Developments

Conclusion & Recommendations